Developing solution and method of forming polyimide pattern by using the developing solution
申请人:Yoshiaki Kawamonzen
公开号:US20010006767A1
公开(公告)日:2001-07-05
Disclosed is a developing solution for a photosensitive polyimide, which consists of an aqueous solution of an amine compound having a base dissociation index pKb [=−log (Kb)=−log (Kw/Ka)=14−pKa, where Kb is a base dissociation constant, Ka is acid dissociation constant of a proton complex, pKa is an acid dissociation index of a proton complex=−log (Ka), and Kw is an ion product of water=1×10
−14
] of 5 to 8 within an aqueous solution of 25° C.
本发明公开了一种用于感光聚酰亚胺的显影液,它由一种胺化合物的水溶液组成,该胺化合物的碱解离指数为 pKb [=-log (Kb)=-log (Kw/Ka)=14-pKa,其中 Kb 是碱解离常数,Ka 是质子络合物的酸解离常数,pKa 是质子络合物的酸解离指数=-log (Ka),Kw 是水的离子积=1×10
-14
]在 25° C 的水溶液中为 5 至 8。