申请人:——
公开号:US20010026904A1
公开(公告)日:2001-10-04
A polymer comprising recurring units of formula (1) and having a Mw of 1,000-500,000 is provided.
1
R
1
is H, methyl or CH
2
CO
2
R
3
, R
2
is H, methyl or CO
2
R
3
, R
3
is alkyl, R
4
is H, alkyl, alkoxyalkyl or acyl, R
5
and R
15
are acid labile groups, and at least one of R
6
to R
9
is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are H or alkyl, at least one of R
10
to R
13
is a monovalent hydrocarbon group containing a —CO
2
— partial structure, and the reminders are H or alkyl, R
14
is a polycyclic hydrocarbon group or polycyclic hydrocarbon-containing alkyl group, Z is a trivalent hydrocarbon group, k=0 or 1, x is>0, a, b, c and d are ≧0, satisfying x+a+b+c+d=1. A resist composition comprising the polymer has significantly improved sensitivity, resolution and etching resistance and is very useful in microfabrication.
本发明提供了一种由式 (1) 重复单元组成且 Mw 为 1,000-500,000 的聚合物。
1
R
1
是 H、甲基或 CH
2
CO
2
R
3
, R
2
是 H、甲基或 CO
2
R
3
, R
3
是烷基,R
4
是 H、烷基、烷氧基烷基或酰基,R
5
和 R
15
是易受酸腐蚀的基团,R
6
至 R
9
是羧基或含羟基的单价烃基,且催化剂是 H 或烷基,R
10
至 R
13
是含有-CO
2
- 部分结构的单价烃基,而催化剂是 H 或烷基,R
14
是多环烃基或含多环烃基烷基,Z 是三价烃基,k&等于;0 或 1,x>0,a、b、c 和 d 是≧0,满足 x+a+b+c+d=1。 包含该聚合物的抗蚀剂组合物具有显著改善的灵敏度、分辨率和抗蚀刻性,在微细加工中非常有用。