A photoacid generator (PAG) and a photoresist composition, the PAG being represented by the following Chemical Formula (I):
wherein, in Chemical Formula (I), L is sulfur (S) or iodine (I), R3 being omitted when L is I; R1, R2, and R3 are each independently a C1 to C10 alkyl, alkenyl, alkynyl, or alkoxy group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and L, or a C6 to C18 aryl, arylalkyl, or alkylaryl group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and L; AL is an acid-labile group; m is 1 to 4; and M is a C1 to C30 hydrocarbon group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and a sulfur atom.
一种光酸发生器(PAG)和一种光刻胶组合物,PAG 由以下
化学式(I)表示:
其中,在
化学式 (I) 中,L 为
硫 (S) 或
碘 (I),当 L 为 I 时省略 R3;R1、R2 和 R3 各自独立地为未被取代或被杂原子取代的 C1 至 C10 烷基、烯基、炔基或烷氧基,使杂原子悬垂或位于基团与 L 之间,或为未被取代或被杂原子取代的 C6 至 C18 芳基、芳烷基或烷芳基,使杂原子悬垂或位于基团与 L 之间;M 是未被取代或被杂原子取代的 C1 至 C30 碳氢基团,杂原子位于该基团与
硫原子之间。