2-Ethoxyethyl acetate;methanol;propane-1,2-diol

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-Ethoxyethyl acetate;methanol;propane-1,2-diol
• 英文别名: 2-ethoxyethyl acetate;methanol;propane-1,2-diol
• 化学式: C10H24O6
• 分子量: 240.29
• InChiKey: RVZQPLCOVDRWMI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.45
• 重原子数：
  16
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  96.2
• 氢给体数：
  3
• 氢受体数：
  6

文献信息

• ULTRAVIOLET ABSORBER, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160053087A1

  公开（公告）日：2016-02-25

  The present invention provides an ultraviolet absorber containing a compound represented by the formula (A-1), wherein R represents a methyl group, an ethyl group, a propyl group, or an allyl group, and R 1 , R 2 , R 3 , and R 4 may be the same or different, and each represent a hydrogen atom, a benzoyl group, a toluoyl group, a naphthoyl group, or an anthranoyl group. By adding the ultraviolet absorber to a composition for forming a resist under layer film, reflection can be suppressed particularly in lithography process by an ultraviolet laser, and a pattern profile can be improved without adverse effects on dry etching mask properties and adhesiveness to a resist pattern.

  本发明提供了一种含有式（A-1）所代表的化合物的紫外线吸收剂，其中R代表甲基基团、乙基基团、丙基基团或烯丙基基团，而R1、R2、R3和R4可以相同也可以不同，每个代表氢原子、苯甲酰基、甲苯酰基、萘甲酰基或蒽甲酰基。通过将紫外线吸收剂添加到用于形成抗蚀底层膜的组合物中，可以在紫外线激光的光刻过程中特别抑制反射，并且可以改善图案轮廓而不会对干法刻蚀掩模特性和对抗蚀图案的附着性产生不良影响。
• FLUORINE-CONTAINING SILICON COMPOUND, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING FLUORINE-CONTAINING SILICON RESIN
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160229960A1

  公开（公告）日：2016-08-11

  The present invention provides a fluorine-containing silicon compound represented by the general formula (1), wherein each R 1 independently represents a hydrocarbon group having 1 to 6 carbon atoms; each R 2 independently represents a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms; and n is an integer satisfying 0≦n≦2. There can be provided a fluorine-containing silicon compound having good storage stability and useful as a raw material of a composition for forming a silicon-containing intermediate film and a silicon-containing photoresist composition used for a fine processing in the manufacturing process of a semiconductor device.

  本发明提供了一种含氟硅化合物，其通式表示为（1），其中每个R1独立地表示具有1至6个碳原子的碳氢基团；每个R2独立地表示氢原子或具有1至6个碳原子的碳氢基团；n是满足0≦n≦2的整数。可以提供一种具有良好储存稳定性的含氟硅化合物，用作形成硅中间膜和硅光刻胶组合物的原料，在半导体器件制造过程中进行精细加工。
• US9522979B2
  申请人：——

  公开号：US9522979B2

  公开（公告）日：2016-12-20
• US9624356B2
  申请人：——

  公开号：US9624356B2

  公开（公告）日：2017-04-18