Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R
1
represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R
2
and R
3
each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
本发明揭示了一种可聚合的
氟单体,其通式如下(1)。在该式中,R1表示氢原子、甲基基团、
氟原子或三
氟甲基基团。n为0或1的整数,m为1到(3+n)的整数。R2和R3各自独立地表示氢原子或保护基团。通过聚合或共聚合该单体得到的
氟聚合物的抗蚀剂适用于通过浸涂曝光或基于浸涂曝光的双重图案化过程进行微细加工。