2-(2-Ethoxyethylsulfanyl)-1-(4-methoxyphenyl)-3,3-dimethylbutan-1-one

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-(2-Ethoxyethylsulfanyl)-1-(4-methoxyphenyl)-3,3-dimethylbutan-1-one
• 英文别名: 2-(2-ethoxyethylsulfanyl)-1-(4-methoxyphenyl)-3,3-dimethylbutan-1-one
• 化学式: C₁₇H₂₆O₃S
• 分子量: 310.5
• InChiKey: IIYNRAATILRIPW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  21
• 可旋转键数：
  9
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.59
• 拓扑面积：
  60.8
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM FORMED USING SAID COMPOSITION, METHOD FOR FORMING PATTERN USING SAID COMPOSITION, PROCESS FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20150277225A1

  公开（公告）日：2015-10-01

  An actinic-ray-sensitive or radiation-sensitive resin composition contains a compound (A) which generates acid by being irradiated with actinic rays or radiation where, when relative light absorbance is ε r using triphenyl sulfonium nonaphlate as a reference and relative quantum efficiency is φ r using triphenyl sulfonium nonaphlate as a reference, the relative light absorbance ε r is 0.4 to 0.8 and ε r ×φ r is 0.5 to 1.0.
• US9405197B2
  申请人：——

  公开号：US9405197B2

  公开（公告）日：2016-08-02
• [EN] PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE<br/>[FR] PROCÉDÉ DE FORMATION DE MOTIFS, COMPOSÉ UTILISÉ DANS CE PROCÉDÉ, COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE AU RAYONNEMENT, FILM DE RÉSERVE, PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE, ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2014119698A1

  公开（公告）日：2014-08-07

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (C1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (C2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.