α,α,β,γ-tetramethyl-β-methacryloyloxy-γ-butyrolactone

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: α,α,β,γ-tetramethyl-β-methacryloyloxy-γ-butyrolactone
• 英文别名: (2,3,4,4-Tetramethyl-5-oxooxolan-3-yl) 2-methylprop-2-enoate；(2,3,4,4-tetramethyl-5-oxooxolan-3-yl) 2-methylprop-2-enoate
• 化学式: C₁₂H₁₈O₄
• 分子量: 226.273
• InChiKey: HBPQGNJYYONDOH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20150322027A1

  公开（公告）日：2015-11-12

  A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development.

  一种单体（1）是通过将一种化合物（9）与碱或金属反应形成金属烯醇盐试剂，然后将金属烯醇盐试剂与一种酰氧基酮化合物（8）反应而制备的。由该单体派生出的聚合物用作基础树脂，以配制一种光刻胶组合物，该组合物在常温下稳定，显示出高溶解对比度、控制的酸性扩散和在碱性显影形成正图案以及有机溶剂显影形成负图案时低粗糙度。
• METHOD FOR MANUFACTRURING BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONES
  申请人：JNC CORPORATION

  公开号：US20150126753A1

  公开（公告）日：2015-05-07

  The art relates to provision of a method for manufacturing an (meth)acrylic polymerizable monomer that can be used in various applications, such as an optical material, a resist material, a coating material and a laminate material, and provision of a new β-(meth)acryloyloxy-γ-butyrolactone compound by applying the manufacturing method. The method for manufacturing the β-(meth)acryloyloxy-γ-butyrolactone compound is described, in which a (meth)acrylate compound having a carbonyl group and a ketene compound are condensed and isomerized. Further, the manufacturing method is applied to the new β-(meth)acryloyloxy-γ-butyrolactone compound.

  这项艺术涉及提供一种用于制造（甲基）丙烯酸酯聚合单体的方法，该单体可用于各种应用，如光学材料、抗蚀材料、涂料和层压材料，并通过应用该制造方法提供一种新的β-(甲基)丙烯酰氧基-γ-丁内酯化合物。描述了制造β-(甲基)丙烯酰氧基-γ-丁内酯化合物的方法，其中将具有羰基的（甲基）丙烯酸酯化合物与酮烯化合物进行缩合和异构化。此外，该制造方法应用于新的β-(甲基)丙烯酰氧基-γ-丁内酯化合物。
• PATTERN FORMING PROCESS AND SHRINK AGENT
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20160139512A1

  公开（公告）日：2016-05-19

  A negative pattern is formed by applying a resist composition onto a substrate, exposing the resist film, and developing the exposed resist film in an organic solvent developer. The process further involves coating the negative pattern with a shrink agent solution of a polymer comprising recurring units capable of forming lactone under the action of acid in a C 7 -C 16 ester or C 8 -C 16 ketone solvent, baking the coating, and removing the excessive shrink agent via organic solvent development for thereby shrinking the size of spaces in the pattern.
• PATTERN FORMING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170010537A1

  公开（公告）日：2017-01-12

  A negative tone pattern is formed by coating a resist composition onto a substrate, prebaking to form a resist film, exposing the resist film to high-energy radiation, PEB the resist film in a high-humidity environment, and developing the resist film in an organic solvent developer. PEB in a high-humidity environment is effective for reducing the shrinkage of the resist film during the step and thus preventing the trench pattern from deformation.
• US9346775B2
  申请人：——

  公开号：US9346775B2

  公开（公告）日：2016-05-24