1-Propoxypropane;1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorooctane

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-Propoxypropane;1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorooctane
• 英文别名: 1-propoxypropane;1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorooctane
• 化学式: C14H19F13O
• 分子量: 450.28
• InChiKey: QJHJGTMNELKGIW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.96
• 重原子数：
  28
• 可旋转键数：
  9
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  14

文献信息

• CROSS-LINKABLE FLUORINATED PHOTOPOLYMER
  申请人：Orthogonal, Inc.

  公开号：US20150030981A1

  公开（公告）日：2015-01-29

  A photosensitive composition comprises a fluorinated solvent, a photo-acid generator and a copolymer. The copolymer comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid-catalyzed cross-linkable group, and a third repeating unit having a sensitizing dye. The composition is useful in the fabrication of electronic devices, especially organic electronic and bioelectronic devices.

  一种光敏组合物包括一种含氟溶剂，一种光酸发生剂和一种共聚物。该共聚物包括至少三个不同的重复单元，包括第一个重复单元具有含氟基团，第二个重复单元具有酸催化交联基团，第三个重复单元具有敏化染料。该组合物在制造电子设备中特别是有机电子和生物电子设备中有用。
• Cross-linkable fluorinated photopolymer
  申请人：Orthogonal, Inc.

  公开号：US10289000B2

  公开（公告）日：2019-05-14

  A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.

  本发明公开了一种光敏组合物，该组合物包括在氟化溶剂（如氢氟醚）中的氟化可光交联聚合物。光交联聚合物包括具有含氟基团但不含肉桂酸基团的第一重复单元和具有含氟肉桂酸基团的第二重复单元。聚合物的总氟含量范围为 30% 至 60%（按重量计）。该组合物可用于在基底和有机电子器件等设备上形成图案化的阻挡层或介电结构。
• METHOD OF PATTERNING A BASE LAYER
  申请人：ORTHOGONAL, INC.

  公开号：EP3072014B1

  公开（公告）日：2018-08-29
• PHOTOLITHOGRAPHIC PATTERNING OF ELECTRONIC DEVICES
  申请人：Orthogonal Inc.

  公开号：EP3238288B1

  公开（公告）日：2020-07-29
• METHOD OF PATTERNING A BIORESORBABLE MATERIAL
  申请人：Bioflex Devices

  公开号：US20150140289A1

  公开（公告）日：2015-05-21

  A method of patterning a bioresorbable material includes providing a fluoropolymer layer in a first pattern over a layer of bioresorbable material. A patterned bioresorbable material is formed by selectively removing the bioresorbable material in areas not covered by the first pattern of fluoropolymer. The fluoropolymer layer may optionally be provided using a photosensitive fluoropolymer along with fluorinated solvents for coating and developing images. The disclosed methods may provide patterned bioresorbable materials having simple or complex shapes, coarse or fine features. In some embodiments, high volume manufacturing methods such as photolithography may be used. Flexible bioelectronic devices may be provided with patterned bioresorbable materials to aid in application into biological targets, but which later bioresorb thereby imparting higher flexibility to the bioelectronic device. In some embodiments, using flexible bioelectronic devices having patterned bioresorbable material corresponding to the device shape can reduces local stresses on biological systems.