[6-[6-(Hydroxymethyl)naphthalen-2-yl]oxynaphthalen-2-yl]methanol

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: [6-[6-(Hydroxymethyl)naphthalen-2-yl]oxynaphthalen-2-yl]methanol
• 英文别名: [6-[6-(hydroxymethyl)naphthalen-2-yl]oxynaphthalen-2-yl]methanol
• 化学式: C₂₂H₁₈O₃
• 分子量: 330.4
• InChiKey: IVPQEDSGNLVCQV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  25
• 可旋转键数：
  4
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.09
• 拓扑面积：
  49.7
• 氢给体数：
  2
• 氢受体数：
  3

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Echigo Masatoshi

  公开号：US20140248561A1

  公开（公告）日：2014-09-04

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
• US9540339B2
  申请人：——

  公开号：US9540339B2

  公开（公告）日：2017-01-10
• US9598392B2
  申请人：——

  公开号：US9598392B2

  公开（公告）日：2017-03-21
• US9908831B2
  申请人：——

  公开号：US9908831B2

  公开（公告）日：2018-03-06