申请人:FUJISAWA PHARMACEUTICAL CO., LTD.
公开号:EP0655442A1
公开(公告)日:1995-05-31
A compound of the following general formula :
wherein
Xis carbonyl or sulfonyl;
Yis bond or lower alkylene;
R¹is halogen, lower alkyl, halo(lower)alkyl, aryloxy, nitro or amino which may have 1 or 2 and same or different substituent(s) selected from lower alkyl, acyl and lower alkanesulfonyl;
R²is aryl or an aromatic hetero(mono- or bi-)cyclic group, and each of which may have 1, 2 or 3 suitable substituent(s);
R³is hydrogen or lower alkyl;
R⁴is
(i) a group of the formula -SO₂-R⁵ in which R⁵ is lower alkyl or aryl optionally substituted with lower alkyl or lower alkoxy,
(ii) a group of the formula
in which R⁶ is aryl optionally substituted with lower alkyl or lower alkoxy, or
(iii) a group of the formula -A-(Z)p in which
A is bond, lower alkylene, lower alkenylene or lower alkynylene,
Z is hydrogen, halogen, hydroxy, nitrile, amino, cyclo(lower)alkyl, aryl, aryloxy, acyl, acylamino, lower alkanesulfonylamino, arylsulfonylamino or an aromatic hetero(mono- or bi-)cyclic group, and each of the cyclic group may have 1, 2 or 3 suitable substituent(s), and
p is 1, 2 or 3; and
nis 0, 1 or 2;
provided that when n or p is more than 1, these R¹ and Z may be the same or different group respectively; or its pharmaceutically acceptable salt, processes for their preparation and pharmaceutical compositions comprising them.
通式如下的化合物:
其中
X为羰基或磺酰基
Y为键或低级亚烷基
R¹为卤素、低级烷基、卤代(低级)烷基、芳氧基、硝基或氨基,可有 1 个或 2 个相同或不同的取代基,这些取代基可选自低级烷基、酰基和低级烷磺酰基;
R² 是芳基或芳香杂(单或双)环基,每个基团可有 1、2 或 3 个合适的取代基;
R³ 是氢或低级烷基;
R⁴是
(i) 式中的基团-SO₂-R⁵,其中 R⁵ 是被低级烷基或低级烷氧基任选取代的低级烷基或芳基、
(ii) 式中的基团
其中 R⁶ 是被低级烷基或低级烷氧基任选取代的芳基,或
(iii) 式中的基团-A-(Z)p,其中
A 是键、低级亚烷基、低级亚烯基或低级亚炔基、
Z 是氢、卤素、羟基、腈、氨基、环(低级)烷基、芳基、芳氧基、酰基、酰氨基、低级烷磺酰氨基、芳基磺酰氨基或芳香杂(单或双)环基,且每个环基可具有 1、2 或 3 个合适的取代基,且
p 是 1、2 或 3;以及
n 为 0、1 或 2;
但当 n 或 p 多于 1 时,这些 R¹ 和 Z 可分别为相同或不同的基团;或其药学上可接受的盐、其制备工艺和包含它们的药物组合物。