2-(3-Hydroxy-3-bicyclo[3.3.1]nonanyl)ethyl 2-methylprop-2-enoate

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-(3-Hydroxy-3-bicyclo[3.3.1]nonanyl)ethyl 2-methylprop-2-enoate
• 英文别名: 2-(3-hydroxy-3-bicyclo[3.3.1]nonanyl)ethyl 2-methylprop-2-enoate
• 化学式: C₁₅H₂₄O₃
• 分子量: 252.35
• InChiKey: AWRULACAEGXXAR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  18
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD
  申请人：FUJIFILM Corporation

  公开号：EP2329320B1

  公开（公告）日：2019-05-01
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND RESIN
  申请人：FUJIFILM Corporation

  公开号：US20210072642A1

  公开（公告）日：2021-03-11

  An actinic ray-sensitive or radiation-sensitive resin composition includes a resin including a repeating unit represented by Formula (1) and capable of increasing a polarity by an action of an acid.
• RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20210181633A1

  公开（公告）日：2021-06-17

  A resist composition that generates an acid upon exposure and has solubility in a developing solution, which is changed by action of an acid, the resist composition containing a resin component having a constitutional unit represented by General Formula (a01-1) and a constitutional unit represented by General Formula (a02-1). In General Formula (a01-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Yax 01 represents a linking group; Ax represents a sulfonyl group or a sulfoxide group; Rax 01 represents an alkyl group, an alkoxy group, a halogen atom, or a halogenated alkyl group; s0 and v0 represent an integer of 0 to 6; and 1≤s0+v0≤6 and u0≤s0+v0. In General Formula (a02-1), Ra 00 represents an acid-dissociable group represented by General Formula (a02-r2-1)