(5-Methylcyclohepta-1,3,6-trien-1-yl)methanol

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: (5-Methylcyclohepta-1,3,6-trien-1-yl)methanol
• 英文别名: (5-methylcyclohepta-1,3,6-trien-1-yl)methanol
• 化学式: C₉H₁₂O
• 分子量: 136.19
• InChiKey: USWUWSQJKKVCLE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• PHOTORESIST REMOVER COMPOSITIONS
  申请人：Merck Patent GmbH

  公开号：EP3752887B1

  公开（公告）日：2022-04-13
• [EN] PHOTORESIST REMOVER COMPOSITIONS<br/>[FR] COMPOSITIONS D'ÉLIMINATION DE PHOTORÉSINE
  申请人：MERCK PATENT GMBH

  公开号：WO2019158234A1

  公开（公告）日：2019-08-22

  The present invention relates to a remover composition comprising, tetraalkylammonium hydroxide, a benzylic alcohol, a glycol component comprising at least one glycol compound, and a and an alkyl amine component, wherein said alkyl amine component is selected from the group consisting of a dialkyl amine, a mono-alkyl amine having structure having structure (I), and combinations thereof wherein, in said dialkyl amine, one of the alkyl groups is a C-1 to C-4 n-alkyl and the other alkyl group is a C-16 to C-20 n-alkyl, and for said mono-alkyl amine m' and m are independently chosen from an integer ranging from 4 to 8. This invention also pertains to the process of using these compositions to remove a patterned photoresist from a substrate.