4-Hydroxy-6-oxabicyclo[3.2.1]octan-7-one | 88255-83-8

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 4-Hydroxy-6-oxabicyclo[3.2.1]octan-7-one
• CAS: 88255-83-8
• 化学式: C₇H₁₀O₃
• 分子量: 142.15
• InChiKey: FJEHNJSXWDSJJG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• Salt suitable for an acid generator and a chemically amplified resist composition containing the same
  申请人：Harada Yukako

  公开号：US20070078269A1

  公开（公告）日：2007-04-05

  The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH 2 — group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q 1 and Q 2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A + represents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

  本发明提供了一种具有公式(I)的盐： 其中环Y代表具有3至30个碳原子的单环或多元环烃基团，其中一个—CH2—基团被—COO—基团取代，并且单环或多元环烃基团中的至少一个氢原子可以可选地被具有1至6个碳原子的烷基取代，具有1至6个碳原子的烷氧基，具有1至4个碳原子的全氟烷基，具有1至6个碳原子的羟基烷基，羟基或腈基；Q1和Q2各自独立地代表氟原子或具有1至6个碳原子的全氟烷基；A+代表有机反离子；n表示0至12的整数。 本发明还提供了一种含有公式(I)盐的化学放大抗蚀剂组合物。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：ICHIKAWA Koji

  公开号：US20100304293A1

  公开（公告）日：2010-12-02

  A salt represented by the formula (a): wherein Q 1 and Q 2 each independently represent a fluorine atom etc., X 1 represents a single bond etc., X 2 represents a single bond etc., Y 1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X 2 —Y 1 group has one or more fluorine atoms, and Z + represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

  由公式(a)表示的盐：其中Q1和Q2各自独立代表氟原子等，X1代表单键等，X2代表单键等，Y1代表C3-C6的脂环烃基等，但条件是—X2—Y1基团具有一个或多个氟原子，以及Z+代表有机反离子，以及包含由公式(a)表示的盐的光阻剂组合物和包含具有酸不稳定的基团并且在水性碱液中不溶或微溶于但在酸性作用下水性碱液中变得可溶的树脂的结构单元。
• ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Kinsho Takeshi

  公开号：US20100304295A1

  公开（公告）日：2010-12-02

  An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R 2 is H or monovalent hydrocarbon, R 3 and R 4 are H or monovalent hydrocarbon, or R 3 and R 4 , taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.

  一种酸敏感酯单体具有螺环结构，其化学式如下（1），其中Z是具有可聚合双键的一价基团，X是形成环戊烷、环己烷或诺邦烷环的二价基团，R2是H或一价碳氢基团，R3和R4是H或一价碳氢基团，或者R3和R4一起表示形成环戊烷或环己烷环的二价基团，n为1或2。从酸敏感酯单体获得的聚合物在酸催化消除反应中具有很高的反应性，因此可以用于制备具有高分辨率的抗蚀组合物。
• Chemical amplification type resist composition
  申请人：Yamada Airi

  公开号：US20080269506A1

  公开（公告）日：2008-10-30

  The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

  本发明提供了一种公式(Ia)的硫鎓盐，包括一个结构单元的聚合物化合物的公式(Ib)，以及一种化学放大型正性光刻胶组合物，包括(A)至少选择自硫鎓盐的公式(Ia)、一个结构单元的聚合物化合物的公式(Ib)和硫鎓盐的公式(Ic)组成的酸发生剂；以及(B)含有酸敏感基团的结构单元的树脂，本身在碱性水溶液中不溶或难溶，但在酸的作用下变得可溶于碱性水溶液。
• Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Harada Yukako

  公开号：US20080081293A1

  公开（公告）日：2008-04-03

  The present invention provides a salt represented by the formula (I): wherein P 1 , P 2 and P 3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, provided that all of P 1 , P 2 and P 3 are not simultaneously phenyl groups which may be substituted, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and R represents a group represented by the formula: wherein A 1 represents —OH or —Y 1 —OH, n represents an integer of 1 to 9, and Y 1 represents a divalent C1-C6 saturated aliphatic hydrocarbon group; a group represented by the formula: wherein ring X 1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —CO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 2 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which a hydrogen atom of one —CH 2 — group is substituted with a hydroxyl group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 3 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —COO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group, and m represents an integer of 0 to 12; or a group represented by the formula: wherein ring X 4 represents a C6-C30 polycyclic hydrocarbon group having tricycle or more, and at least one hydrogen atom in the polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group or a cyano group, and l represents an integer of 1 to 12. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

  本发明提供了一种盐，其表示为公式（I）：其中P1、P2和P3各自独立地表示一个C1-C30烷基基团，该基团可以被至少一个羟基、一个C3-C12环烃基团和一个C1-C12烷氧基中的至少一个取代，或者一个C3-C30环烃基团，该基团可以被至少一个羟基和一个C1-C12烷氧基中的至少一个取代，前提是P1、P2和P3均不同时为可以被取代的苯基；Q1和Q2各自独立地表示氟原子或者C1-C6全氟烷基基团，R表示由以下公式表示的一个基团：其中A1表示—OH或—Y1—OH，n表示1到9之间的整数，Y1表示二价的C1-C6饱和脂肪族碳氢基团；一个由以下公式表示的基团：其中环X1表示一个C3-C30的单环或多环碳氢基团，其中一个—CH2—基团被—CO—取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代；一个由以下公式表示的基团：其中环X2表示一个C3-C30的单环或多环碳氢基团，其中一个— —基团的氢原子被羟基取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代；一个由以下公式表示的基团：其中环X3表示一个C3-C30的单环或多环碳氢基团，其中一个— —基团被—COO—取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代，m表示0到12之间的整数；或者一个由以下公式表示的基团：其中环X4表示一个具有三环或更多的C6-C30多环碳氢基团，多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团或氰基取代，l表示1到12之间的整数。本发明还提供了一种化学增感抗蚀组合物，其包含上述公式（I）表示的盐。