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3,3-Difluoro-2-(trifluoromethyl)bicyclo[2.2.1]hept-5-en-2-ol | 370102-71-9

中文名称
——
中文别名
——
英文名称
3,3-Difluoro-2-(trifluoromethyl)bicyclo[2.2.1]hept-5-en-2-ol
英文别名
——
3,3-Difluoro-2-(trifluoromethyl)bicyclo[2.2.1]hept-5-en-2-ol化学式
CAS
370102-71-9
化学式
C8H7F5O
mdl
——
分子量
214.13
InChiKey
JLBMCECANBMNQK-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.1
  • 重原子数:
    14
  • 可旋转键数:
    0
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.75
  • 拓扑面积:
    20.2
  • 氢给体数:
    1
  • 氢受体数:
    6

文献信息

  • PHOTOSENSITIVE SILSESQUIOXANE RESIN
    申请人:DOW CORNING CORPORATION
    公开号:EP1660561A2
    公开(公告)日:2006-05-31
  • JP2009543135A
    申请人:——
    公开号:JP2009543135A
    公开(公告)日:2009-12-03
  • Silsesquioxane Resin
    申请人:Hu Sanlin
    公开号:US20070281242A1
    公开(公告)日:2007-12-06
    This invention pertains to a silsesquioxane resin with improved lithographic properties (such as etch-resistance, transparency, resolution, sensitivity, focus latitude, line edge roughness, and adhesion) suitable as a photoresist; a method for incorporating the fluorinated or non-fluorinated functional groups onto silsesquioxane backbone. The silsesquioxane resins of this invention has the general structure (HSiO 3/2 ) a (RSiO 3/2 ) b wherein; R is an acid dissociable group, a has a value of 0.2 to 0.9 and b has a value of 0.1 to 0.8 and 0.9≦a+b≦1.0.
  • SILSESQUIOXANE RESIN SYSTEMS WITH BASE ADDITIVES BEARING ELECTRON-ATTRACTING FUNCTIONALITIES
    申请人:Hu Sanlin
    公开号:US20090202941A1
    公开(公告)日:2009-08-13
    Silsesquioxane-based compositions that contain (a) silsesquioxane resins that contain HSiO3/2 units and RSiO 3/2 units wherein; R is an acid dissociable group, and (b) least one organic base additive selected from bulky tertiary amines, imides, amides and the polymeric amines wherein the organic base additive contains an electron-attracting group with the provision that the organic base additive is not 7-diethylamino-4-methylcoumarin. The silsesquioxane-based compositions are useful as positive resist compositions in forming patterned features on substrate, particularly useful for multi-layer layer (i.e. bilayer) 193 nm & 157 nm photolithographic applications.
  • US7511179B2
    申请人:——
    公开号:US7511179B2
    公开(公告)日:2009-03-31
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