2,3,4-Trimethylhexan-3-ol | 66793-90-6

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2,3,4-Trimethylhexan-3-ol
• CAS: 66793-90-6
• 化学式: C₉H₂₀O
• 分子量: 144.25
• InChiKey: LTKHKGAPVGSECA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  10
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• TRI-CYCLIC PYRAZOLOPYRIDINE KINASE INHIBITORS
  申请人：Vertex Pharmaceuticals Incorporated

  公开号：EP2318408B1

  公开（公告）日：2016-02-17
• COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM
  申请人：Sakamoto Rikimaru

  公开号：US20120251955A1

  公开（公告）日：2012-10-04

  There is provided a composition for forming a resist underlayer film for electron beam or EUV lithography that is used in a device manufacture process using EUV lithography, reduces the adverse effects caused by an electron beam or EUV, and is effective for the formation of a good resist pattern and a resist pattern formation method using the composition for forming a resist underlayer film for lithography. A composition for forming a resist underlayer film for electron beam or EUV lithography, comprising: a polymer having a repeating unit structure of Formula (1): [where Q is a group of Formula (2) or Formula (3): where Q 1 is a C 1-10 alkylene group, a phenylene group, a naphthylene group, or an anthrylene group, X 1 is a group of Formula (4), Formula (5), or Formula (6): and a solvent.