4-(2-(4-Pyridyloxy)ethoxy)pyridine | 50789-62-3

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 4-(2-(4-Pyridyloxy)ethoxy)pyridine
• 英文别名: 4-(2-pyridin-4-yloxyethoxy)pyridine
• CAS: 50789-62-3
• 化学式: C₁₂H₁₂N₂O₂
• 分子量: 216.24
• InChiKey: RRCWJXNJBQORGX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  16
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.17
• 拓扑面积：
  44.2
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：ICHIKAWA Koji

  公开号：US20100304293A1

  公开（公告）日：2010-12-02

  A salt represented by the formula (a): wherein Q 1 and Q 2 each independently represent a fluorine atom etc., X 1 represents a single bond etc., X 2 represents a single bond etc., Y 1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X 2 —Y 1 group has one or more fluorine atoms, and Z + represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

  由公式(a)表示的盐：其中Q1和Q2各自独立代表氟原子等，X1代表单键等，X2代表单键等，Y1代表C3-C6的脂环烃基等，但条件是—X2—Y1基团具有一个或多个氟原子，以及Z+代表有机反离子，以及包含由公式(a)表示的盐的光阻剂组合物和包含具有酸不稳定的基团并且在水性碱液中不溶或微溶于但在酸性作用下水性碱液中变得可溶的树脂的结构单元。
• SALT AND PROCESS FOR PRODUCING ACID GENERATOR
  申请人：YOSHIDA Isao

  公开号：US20110201823A1

  公开（公告）日：2011-08-18

  A salt represented by the formula (I0): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L 1 represents a divalent C1-C17 hydrocarbon group in which one or more —CH 2 — can be replaced by —O— or —CO—, m represents 1 or 2, and Z m+ represents m-valent organic or inorganic cation.

  根据您提供的化学公式(I0)，其翻译成中文为： 其中Q1和Q2各自独立代表一个氟原子或一个C1-C6全氟烷基团，L1代表一个二价的C1-C17碳氢化合物基团，在该基团中，一个或多个—CH2—可以被—O—或—CO—所替换，m代表1或2，而Zm+代表m价有机或无机阳离子。
• SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160052877A1

  公开（公告）日：2016-02-25

  A salt represented by the formula (I); wherein Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, L b1 represents a single bond or a divalent C 1 to C 24 saturated hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C 3 to C 18 alicyclic hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C 6 to C 20 aromatic hydrocarbon group, and Z + represents an organic sulfonium cation or an organic iodonium cation.

  根据您的要求，以下是化合物的中文翻译： 由公式(I)表示的盐； 其中Q1和Q2各自独立代表一个氟原子或一个C1至C6的过氟代烷基团，Lb1代表一个单键或一个二价的C1至C24的饱和烃基团，其中甲基烯基团可以被一个氧原子或一个羰基团所取代，并且其中氢原子可以被一个羟基或一个氟原子所取代，并且Y代表一个氢原子，一个氟原子，或一个可选地被取代的C3至C18的芳环烃基团，其中甲基烯基团可以被一个氧原子，一个羰基团或一个磺酰基团所取代；并且Ar代表一个二价的C6至C20的芳香烃基团，以及Z+代表一个有机硫正离子或一个有机碘正离子。
• SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160334702A1

  公开（公告）日：2016-11-17

  A salt represented by formula (I): wherein Q 1 and Q 2 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, R 1 and R 2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C 1 to C 6 perfluoroalkyl group, z represents an integer of 0 to 6, X 1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R 1 )(R 2 ) or C(Q 1 )(Q 2 ), A 1 represents a C 4 to C 24 hydrocarbon group having a C 4 to C 18 divalent alicyclic hydrocarbon moiety, A 2 represents a C 2 to C 12 divalent hydrocarbon group, R 3 and R 4 independently represent a hydrogen atom or a C 1 to C 6 monovalent saturated hydrocarbon group, R 5 represents a hydrogen atom, a fluorine atom, or a C 1 to C 6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z + represents an organic cation.

  公式(I)表示的盐，其中Q1和Q2独立地代表一个氟原子或一个C1至C6的过氟烷基团，R1和R2每次出现独立地代表一个氢原子、一个氟原子或一个C1至C6的过氟烷基团，z代表0到6的整数，X1代表*—CO—O—，*—O—CO—或—O—，*代表与C(R1)(R2)或C(Q1)(Q2)的连接位置，A1代表具有C4至C18二价脂环烃基团的C4至C24的烃基团，A2代表C2至C12的二价烃基团，R3和R4独立地代表一个氢原子或一个C1至C6的一价饱和烃基团，R5代表一个氢原子、一个氟原子或一个C1至C6的烷基团，其中氢原子可以被氟原子替换，而Z+代表一个有机阳离子。
• SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160200702A1

  公开（公告）日：2016-07-14

  A salt represented by the formula (I): wherein R 1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q 1 and Q 2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A 1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R 2 represents an acid-labile group; and “m” represents an integer of 0 to 3.

  由公式(I)表示的盐： 其中 R1 代表一个C1至C12的烷基，其中一个亚甲基基团可以被一个氧原子或一个羰基团所取代； Q1 和 Q2 各自独立地代表一个氟原子或一个C1至C6的全氟烷基团； A1 代表一个含有内酯环的基团，该基团有4到24个碳原子； R2 代表一个酸不稳定的基团；并且 “m”代表一个0到3之间的整数。