申请人:J.T. BAKER INC.
公开号:EP0198674A2
公开(公告)日:1986-10-22
Positive deep ultra-violet photoresists which are base-developable comprise a base-soluble polymer and, as a photo- sensitive solubilising agent, a substituted 2-diazocyclohexane--1,3-dione.
可碱显影的正性深紫外光阻光胶由碱溶性聚合物和作为光敏增溶剂的取代 2-二氮环己烷-1,3-二酮组成。