2-Methoxy-2-methylbutan-1-ol | 143222-30-4

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-Methoxy-2-methylbutan-1-ol
• CAS: 143222-30-4
• 化学式: C₆H₁₄O₂
• 分子量: 118.17
• InChiKey: VCCCOJNCORYLID-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.5
• 重原子数：
  8
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  29.5
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• Compounds useful for treating AIDS
  申请人：Société Splicos

  公开号：EP2465502A1

  公开（公告）日：2012-06-20

  The present invention relates to compound (I) for use as an agent for preventing, inhibiting or treating AIDS. The present invention further relates to compounds of formula (I) wherein X is CR0 or N; R0, R1, R2, R3, R4, R7 and R8 independently represent a hydrogen atom, a halogen atom or a group chosen among a (C1-C5)alkyl group, a (C3-C6)cycloalkyl group, a (C1-C5)fluoroalkyl group, a (C1-C5)alkoxy group, a (C1-C5)fluoroalkoxy group, a -CN group, a -COORa group, a -NO2 group, a -NRaRb group, a -NRa-SO2-NRaRb group, a -NRa-SO2-Ra group, a -NRa-C(=O)-Ra group, a -NRa-C(=O)-NRaRb group, a -SO2-NRaRb group, a -SO3H group, a -OH group, a -O-SO2-ORc group, a -O-P(=O)-(ORc)(ORd) group, a -O-CH2-COORc group and can further be a group chosen among: R5 represents a hydrogen atom, a (C1-C5)alkyl group or a (C3-C6)cycloalkyl group; R10 is a hydrogen atom or a chlorine atom, and R11 is a hydrogen atom or a (C1-C4)alkyl group or anyone of its pharmaceutically acceptable salts.

  本发明涉及用于防止、抑制或治疗艾滋病的化合物（I）。本发明进一步涉及公式（I）的化合物，其中X是CR0或N；R0、R1、R2、R3、R4、R7和R8独立地代表一个氢原子、一个卤素原子或一个选自（C1-C5）烷基团、（C3-C6）环烷基团、（C1-C5）氟烷基团、（C1-C5）烷氧基团、（C1-C5）氟烷氧基团、-CN基团、-COORa基团、-NO2基团、-NRaRb基团、-NRa-SO2-NRaRb基团、-NRa-SO2-Ra基团、-NRa-C(=O)-Ra基团、-NRa-C(=O)-NRaRb基团、-SO2-NRaRb基团、-SO3H基团、-OH基团、-O-SO2-ORc基团、-O-P(=O)-(ORc)(ORd)基团、-O-CH2-COORc基团，并且还可以是一个选自：R5代表一个氢原子、一个（C1-C5）烷基团或一个（C3-C6）环烷基团；R10是一个氢原子或一个氯原子，R11是一个氢原子或一个（C1-C4）烷基团或其药用可接受盐的任何一个。
• Liquid crystal orienting agent
  申请人：JAPAN SYNTHETIC RUBBER CO., LTD.

  公开号：EP0735403A1

  公开（公告）日：1996-10-02

  A liquid crystal aligning agent contains (1) at least one polymer selected from the group consisting of a polyamic acid obtainable by a reaction between a tetracarboxylic acid dianhydride and a diamine compound and an imidized polymer obtainable by cyclization with dehydration of the polyamic acid; (2) at least one first solvent selected from the group consisting of N-alkyl-2-pyrrolidones, lactones, and 1,3-dialkyl-2-imidazolidinones; (3) at least one second solvent selected from the group consisting of: (a) a first compound represented by general formula (I) wherein R1 is an alkylene group having 2 or 3 carbon atoms; R2 is an alkyl group having 1 to 4 carbon atoms an acetyl group or a propionyl group; R3 is an alkyl group having 1 to 3 carbon atoms, an alkoxyl group having 1 to 3 carbon atoms, or a halogen atom; a is 1 or 2; and b is 0 or integers of from 1 to 5; and (b) a second compound represented by general formula (II) wherein R4 is an alkyl group having 1 to 4 carbon atoms; R5 is an alkylene group having 2 or 3 carbon atoms; R6 is an alkyl group having 1 to 3 carbon atoms; and c is 1 or 2.

  液晶对准剂包含 (1) 至少一种聚合物，选自由四羧酸二酐和二胺化合物反应生成的聚氨基 酸和聚氨基酸脱水环化生成的亚胺化聚合物组成的组； (2) 至少一种第一溶剂，选自由 N-烷基-2-吡咯烷酮、内酯和 1,3-二烷基-2-咪唑烷酮组成的组； (3) 至少一种第二溶剂，选自由下列物质组成的组 (a) 通式 (I) 所代表的第一种化合物 其中 R1 是具有 2 或 3 个碳原子的亚烷基；R2 是具有 1 至 4 个碳原子的烷基、乙酰基或丙酰基；R3 是具有 1 至 3 个碳原子的烷基、具有 1 至 3 个碳原子的烷氧基或卤原子；a 是 1 或 2；b 是 0 或 1 至 5 的整数；以及 (b) 通式(II)代表的第二种化合物 其中 R4 是具有 1 至 4 个碳原子的烷基；R5 是具有 2 或 3 个碳原子的亚烷基；R6 是具有 1 至 3 个碳原子的烷基；以及 c 是 1 或 2。
• Resist stripping composition
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP1091254A2

  公开（公告）日：2001-04-11

  A resist stripping composition contains 0.001 to 0.5% by weight of a fluorine compound, 50 to 99% by weight of an ether solvent and the balance being substantially water. With such a specific content range of the ether solvent, the resist stripping composition shows reduced corrosive properties when diluted with water in the rinsing step as well as shows complete removal of resist residues without causing corrosion of wiring materials and substrate materials.

  一种抗蚀剂剥离组合物含有 0.001 至 0.5%（按重量计）的氟化合物、50 至 99% （按重量计）的醚类溶剂，其余部分基本上为水。在这样的醚溶剂含量范围内，抗蚀剂剥离组合物在漂洗步骤中被水稀释后，其腐蚀性降低，并能完全去除抗蚀剂残留物，而不会对配线材料和基底材料造成腐蚀。
• Composition for stripping and cleaning and use thereof
  申请人：AIR PRODUCTS AND CHEMICALS, INC.

  公开号：EP1612858A2

  公开（公告）日：2006-01-04

  A composition comprising one or more water soluble organic solvents comprising a glycol ether; water; a fluoride containing compound provided that if the fluoride containing compound is ammonium fluoride than no additional fluoride containing compound is added to the composition; optionally a quaternary ammonium compound; and optionally a corrosion inhibitor is disclosed herein that is capable of removing residues from an article such as photoresist and/or etching residue. Also disclosed herein is a method for removing residues from an article using the composition disclosed herein.

  本文公开了一种组合物，该组合物包含一种或多种水溶性有机溶剂，其中包括乙二醇醚；水；含氟化合物（如果含氟化合物是氟化铵，则无需向组合物中添加额外的含氟化合物）；可选的季铵化合物；以及可选的腐蚀抑制剂，该组合物能够去除物品上的残留物，如光刻胶和/或蚀刻残留物。本文还公开了一种使用本文公开的组合物去除物品残留物的方法。
• Composition for removal of residue comprising cationic salts and methods using same
  申请人：Air Products and Chemicals, Inc.

  公开号：EP1736534A1

  公开（公告）日：2006-12-27

  The present invention relates to an aqueous cleaning composition used to remove unwanted organic and inorganic residues and contaminants from a substrate such as, for example, a semiconductor substrate. The cleaning composition comprises from about 0.01 % to about 40 % by weight of a salt selected from a guanidinium salt, an acetamidinium salt, a formamidinium salt, and mixtures thereof; water; and optionally a water soluble organic solvent. Compositions according to the present invention are free of an oxidizer and abrasive particles and are capable of removing residues from a substrate and, particularly, a substrate having silicon-containing BARC and/or photoresist residue.

  本发明涉及一种水性清洗组合物，用于去除基底（例如半导体基底）上不需要的有机和无机残留物和污染物。该清洁组合物包含按重量计约 0.01 % 至约 40 % 的盐（选自胍盐、乙酰胺盐、甲酰胺盐及其混合物）；水；以及可选的水溶性有机溶剂。根据本发明的组合物不含氧化剂和研磨颗粒，能够去除基底上的残留物，特别是含有含硅 BARC 和/或光刻胶残留物的基底。