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1-tert-Butyl-4-ethoxycyclohexane | 1900-57-8

中文名称
——
中文别名
——
英文名称
1-tert-Butyl-4-ethoxycyclohexane
英文别名
——
1-tert-Butyl-4-ethoxycyclohexane化学式
CAS
1900-57-8
化学式
C12H24O
mdl
——
分子量
184.32
InChiKey
AFEPVZGXOWEVFP-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.7
  • 重原子数:
    13
  • 可旋转键数:
    3
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    9.2
  • 氢给体数:
    0
  • 氢受体数:
    1

SDS

SDS:8af5865409aba69113ed8e4bad2761aa
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文献信息

  • HEMIACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
    申请人:Shin-Etsu Chemical Co., Ltd.
    公开号:US20160238930A1
    公开(公告)日:2016-08-18
    A polymer for resist use is obtainable from a hemiacetal compound having formula (1 a ) wherein R 1 is H, CH 3 or CF 3 , R 2 to R 4 each are H or a monovalent hydrocarbon group, X 1 is a divalent hydrocarbon group, ZZ designates a non-aromatic mono- or polycyclic ring of 4 to 20 carbon atoms having a hemiacetal structure, k 1 =0 or 1, and k 2 =0 to 3. A resist composition comprising the polymer displays controlled acid diffusion and low roughness during both positive and negative tone developments.
    从具有以下式(1a)的半缩醛化合物获得用于抗蚀的聚合物,其中R1为H、CH3或CF3,R2至R4分别为H或单价碳氢基团,X1为二价碳氢基团,ZZ表示具有半缩醛结构的非芳香性4至20个碳原子的单环或多环环,k1=0或1,k2=0至3。包含该聚合物的抗蚀组合物显示出在正片和负片显影过程中控制酸扩散和低粗糙度。
  • MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20150323865A1
    公开(公告)日:2015-11-12
    A polymer for resist use is obtainable from a monomer having formula (1) wherein R 1 is H, CH 3 or CF 3 , R 2 and R 3 each are H or a monovalent hydrocarbon group, X 1 is a divalent hydrocarbon group, k 1 =0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.
    可以从具有式(1)的单体获得用于抗蚀的聚合物,其中R1为H、CH3或CF3,R2和R3各自为H或一价碳氢基团,X1为二价碳氢基团,k1=0或1,Z形成5或6元脂环。包含该聚合物的抗蚀组合物具有货架稳定性,显示高溶解对比度,控制酸扩散和低粗糙度,在碱性显影和有机溶剂显影过程中表现出色。
  • POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
    申请人:HASEGAWA Koji
    公开号:US20130017484A1
    公开(公告)日:2013-01-17
    Polymerizable ester compounds having formula (1) are novel wherein R 1 is H, F, methyl or trifluoromethyl, R 2 is an acid labile group, Aa is a divalent hydrocarbon group which may be separated by —O— or —C(═O)—, and k 1 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent developed properties.
    具有式(1)的可聚合酯化合物是新颖的,其中R1为H、F、甲基或三氟甲基,R2为酸敏感基团,Aa为二价的碳氢基团,可以通过—O—或—C(═O)—分离,k1为0或1。它们可用作单体,用于生产对辐射≦500 nm透明的聚合物。以这些聚合物作为基础树脂的辐射敏感抗蚀剂组合物表现出优异的显影性能。
  • Conformationally Restricted 4-Substituted-2,6-dimethylfuro[2,3-d]pyrimidines as Multi-targeted Receptor Tyrosine Kinase Inhibitors and Microtubule Targeting Antitumor Agents
    申请人:Duquesne University of the Holy Spirit
    公开号:US20160176891A1
    公开(公告)日:2016-06-23
    Compounds of Formula I: and compounds of Formula II: are provided. Pharmaceutical compositions comprising either the compound of Formula I or Formula II are disclosed. Methods of treating patients having cancer are provided by administering to the patient a therapeutically effective amount of one or more compounds having Formula I or Formula II to treat the patient. The compounds of Formula I or II are preferably conformationally restricted furo[2,3-d]pyrimidines having dual inhibition of microtubule assembly and receptor tyrosine kinases.
    提供了化学式I和化学式II的化合物。揭示了包含化学式I或化学式II化合物的制药组合物。通过向患有癌症的患者投与具有化学式I或化学式II的一个或多个化合物的治疗有效量来治疗患者的方法。化学式I或II的化合物通常是具有微管组装和受体酪氨酸激酶双重抑制作用的构象限制的呋喃[2,3-d]嘧啶类化合物。
  • FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER, RESIST COMPOSITION AND RESIST PROTECTIVE FILM COMPOSITION
    申请人:Asahi Glass Company, Limited
    公开号:EP1772468A1
    公开(公告)日:2007-04-11
    To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength range, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer. A fluoropolymer having monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1) :         CF2=CFCF2C(CF3) (OR1)-(CH2)nCR2=CHR3     (1) wherein R1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, or (CH2)aCOOR4 (wherein a is 0 or 1, and R4 is a hydrogen atom or an alkyl group having at most 20 carbon atoms), each of R2 and R3, which are independent of each other, is a hydrogen atom or an alkyl group having at most 12 carbon atoms, and n is 0 or 2, provided that when n is 0, at least one of R1, R2 and R3 is other than a hydrogen atom.
    提供一种具有官能团且在宽波长范围内具有高透明度的含氟聚合物,以及包含该含氟聚合物的抗蚀剂组合物和抗蚀剂保护膜组合物。 一种含氟聚合物,其单体单元由式(1)代表的氟化二烯环聚合而成: CF2=CFCF2C(CF3) (OR1)-(CH2)nCR2=CHR3 (1) 其中 R1 是氢原子、最多具有 20 个碳原子的烷基或 (CH2)aCOOR4 (其中 a 是 0 或 1,R4 是氢原子或最多具有 20 个碳原子的烷基),R2 和 R3 各自相互独立,是氢原子或最多具有 12 个碳原子的烷基,n 是 0 或 2,但当 n 为 0 时,R1、R2 和 R3 中至少有一个不是氢原子。
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