申请人:SMITH KLINE & FRENCH LABORATORIES
LIMITED
公开号:EP0087274A2
公开(公告)日:1983-08-31
The invention provides histamine H2-antaponist compounds of formula (1):-
and pharmaceutically acceptable salts thereof, where
W is a 2-furanyl or 2-thienyl group optionally substituted in the 5-position with a group R1R2N(CH2)a-; a 2-pyridyl group optionally substituted in the 4- or 6-position with a group R1R2N(CH2)a-; a phenyl group substituted in the 3-or 4-position with a group R1R2N(CH2)a-; a 4-imidazolyl group optionally substituted in the 5-position with methyl or bromine; a 2-pyridyl group optionally substituted in the 3-position with C1-4 alkyl, C1-4, alkoxy, halogen, amino or hydroxy; a 2-thiazolyl group or a 2-guanidino-4-thiazolyl group;
X is (CH2)b in which b is from 3 to 6, or (CH2)dS(CH2)e in which dand e are the same or different and are from 1 to 3 or, when W is substituted phenyl or 2-pyridyl substituted in the 4- or 6- position with a group R1R2N(CH2)a-, O(CH2)t in which f is from 2 to 5;
Z is hydrogen or C1-4 alkyl;
A is C1-C5 alkylene or (CH2)pA1(CH2)q- where A' is oxygen or sulphur and p and q are such that their sum is from 1 to 4;
B is an optionally substituted pyridyl, where the optional substituent is one or more C1-4 alkyl, or C1-4 alkoxy or hydroxy groups or halogen atoms or an N-oxo group or a phenyl group optionally substituted with one or more C1-4 alkyl or C1-4 alkoxy groups or halogen atoms or B is a 6-(2,3-dihydro-1,4-benzodioxinyl) or a 5-(1,3-benzodioxolyl) group or B is a 2-furanyl or 2-thienyl group optionally substituted in the 5-position with a group R1R2N(CH2)a-; a phenyl group substituted in the 3- of 4-position with a group R1R2N(CH2)a- or a 3-pyridyl group substituted in the 5- or 6-position or a 4-pyridyl group substituted in the 2-position by a group R1R2N(CH2)a-;
R' and R2 can be the same or different and are hydrogen or C1-4 alkyl or together form a 1,4-butanediyl, 1,5-pentanediyl, 1,6-hexanediyl or 1,7-heptanediyl group; and a is 1 to 4.
本发明提供了式(1)的组胺 H2- 拮抗剂化合物
及其药学上可接受的盐类,其中
W 是在 5 位上任选被基团 R1R2N(CH2)a- 取代的 2-呋喃基或 2-噻吩基; 在 4 或 6 位上任选被基团 R1R2N(CH2)a- 取代的 2-吡啶基; 在 3 或 4 位上任选被基团 R1R2N(CH2)a- 取代的苯基;在 5 位上任选被甲基或溴取代的 4-咪唑基; 在 3 位上任选被 C1-4 烷基、C1-4、烷氧基、卤素、氨基或羟基取代的 2-吡啶基; 2-噻唑基或 2-胍基-4-噻唑基;
X为(CH2)b,其中 b 为 3 至 6,或(CH2)dS(CH2)e,其中 d 和 e 相同或不同且为 1 至 3,或当 W 为在 4 或 6-位被基团 R1R2N(CH2)a- 取代的取代苯基或 2-吡啶基时,为 O(CH2)t,其中 f 为 2 至 5;
Z 是氢或 C1-4 烷基;
A 是 C1-C5 亚烷基或 (CH2)pA1(CH2)q- 其中 A' 是氧或硫,p 和 q 之和为 1 至 4;
B 是任选取代的吡啶基,其中任选取代基是一个或多个 C1-4 烷基或 C1-4 烷氧基或羟基或卤素原子或 N-氧代基团或任选被一个或多个 C1-4 烷基或 C1-4 烷氧基或卤素原子取代的苯基或 B 是 6-(2、或 B 是 6-(2,3-二氢-1,4-苯并二恶茂基)或 5-(1,3-苯并二恶茂基)基团,或 B 是 2-呋喃基或 2-噻吩基基团,可选择在 5 位被 R1R2N(CH2)a-基团取代;在 3 位或 4 位被基团 R1R2N(CH2)a- 取代的苯基,或在 5 位或 6 位被基团 R1R2N(CH2)a- 取代的 3-吡啶基,或在 2 位被基团 R1R2N(CH2)a- 取代的 4-吡啶基;
R'和 R2 可以相同或不同,并且是氢或 C1-4 烷基,或共同形成 1,4-丁二基、1,5-戊二基、1,6-己二基或 1,7-庚二基;且 a 为 1 至 4。