The present invention provides a photoreactive agent for removing harmful materials which comprises a substrate and a layer containing a photoreactive semiconductor and organic fine particles coated with inorganic fine particles which is formed on at least one side of the substrate; a photoreactive agent for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing organic fine particles coated with inorganic fine particles which layers are formed in that order on at least one side of the substrate; a photoreactive agent for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing film-forming inorganic fine particles and a water repellent which layers are formed in that order on at least one side of the substrate; and a photoreactive agent for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor, a layer containing film-forming inorganic fine particles and a layer containing a water repellent which layers are formed in that order on at least one side of the substrate. Said photoreactive agents for removing harmful materials are excellent in ability to remove harmful materials such as malodor, are water-resistant, are not changed in characteristics over a long period of time, and can easily be produced.
本发明提供了一种光敏剂,用于去除有害物质,其中包括基底和涂有无机细粒子的有机细粒子层以及包含光敏半导体的层,该层形成在基底的至少一侧;一种去除有害物质的光敏剂,包括基底、包含光敏半导体的层和包含涂有无机细粒子的有机细粒子的层,这些层按顺序形成在基底的至少一侧;一种去除有害物质的光敏剂,包括基底、包含光敏半导体的层、包含成膜无机细粒子和疏
水剂的层,这些层按顺序形成在基底的至少一侧;以及一种去除有害物质的光敏剂,包括基底、包含光敏半导体的层、包含成膜无机细粒子和包含疏
水剂的层,这些层按顺序形成在基底的至少一侧。这些去除有害物质的光敏剂具有出色的去除恶臭等有害物质的能力,耐
水性强,长期内不会改变特性,而且易于生产。