申请人:BOE Technology Group Co., Ltd.
公开号:US20140120474A1
公开(公告)日:2014-05-01
The invention discloses a deep-ultraviolet chemically-amplified positive photoresist. The deep-ultraviolet chemically-amplified positive photoresist according to one embodiment of the invention includes a cyclopentenyl pimaric acid, a divinyl ether, a photoacid generator and an organic solvent. The deep-ultraviolet chemically-amplified positive photoresist according to the invention has a good sensitivity and a good transparency.