制备去氟胺和去亚硝基胺二类无环R 2 NF 和R 2 NNO (R=CH 3 ,C 2 H 5 ,nC 3 H 7 ,iC 3 H 7 ,nC 4 H 9 ,iC 4 H 9 ,cC 6 H 11 ) et de fluoroamines et nitrosoamines 杂环饱和 RNF et RNNO (R=cC 4 H 8 ,cC 5 H 10 ,(CH 3 ) 2 -2,6-cC 5 H 8 ,(CH 3 ) 4 -2,2,6 ,6-cC 5 H 6 ) par 反应脱胺对应物 avec NF 3 O
Two types of FNO compounds (FNO and F 3 NO) were evaluated as candidates for new chemical vapor deposition (CVD) chambercleaninggases. NF 3 and C 2 F 6 were measured as the reference. Like NF 3 , as these gases have no carbon in their molecules, no perfluoro carbon (PFC) is thought to be emitted. FNO is a compound highly susceptible to hydrolysis. F 3 ND is expected to decompose more easily than
两种类型的 FNO 化合物(FNO 和 F 3 NO)被评估为新化学气相沉积 (CVD) 室清洁气体的候选气体。测量NF 3 和C 2 F 6 作为参考。与 NF 3 一样,由于这些气体的分子中不含碳,因此认为不会排放全氟化碳 (PFC)。FNO 是一种极易水解的化合物。预计 F 3 ND 在大气中比 NF 3 更容易分解,因为它的 NF 键已通过将 N=O 键引入分子中而减弱。因此,预计这些化合物对全球变暖的贡献很小。这些气体的性能是通过测量它们的蚀刻速率和它们的废气来评估的。结果表明,F 3 NO 的蚀刻速率实际上与NF 3 的蚀刻速率相同,而FNO 的蚀刻速率约为NF 3 的1/2。然而,
Synthesis and Properties of N<sub>7</sub>O<sup>+</sup>
作者:Karl O. Christe、Ralf Haiges、William W. Wilson、Jerry A. Boatz
DOI:10.1021/ic9022213
日期:2010.2.1
The reaction of NOF2+SbF6− with an equimolar amount of HN3 in an anhydrous HF solution at −45 °C produces N3NOF+SbF6−. When an excess of HN3 is used in this reaction, N7O+SbF6− is formed. However, this compound could not be isolated as a solid and rapidly decomposed in a quantitative manner with N2O evolution to N5+SbF6−. This reaction represents a novel and more convenient synthesis for N5+SbF6− because
Metcalf, Steven G.; Shreeve, Jean'ne M., Inorganic Chemistry, 1972, vol. 11, # 7, p. 1631 - 1634
作者:Metcalf, Steven G.、Shreeve, Jean'ne M.
DOI:——
日期:——
Endothermic Formation of a Chemical Bond by Entropic Stabilization: Difluoronitroxide Radical in Solid Argon
作者:Eugenii Ya. Misochko、Alexander V. Akimov、Ilya U. Goldschleger、Alexander I. Boldyrev、Charles A. Wight
DOI:10.1021/ja982222r
日期:1999.1.1
Difluoronitroxide radical (F2NO) has been formed in solid argon matrices by successive addition of two diffusing F atoms to NO. This radical exists in dynamic equilibrium with a van der Waals complex (F-FNO). Measurements of the equilibrium concentrations as a function of temperature show that the changes in enthalpy and the entropy associated with formation of the F2NO radical are Delta H = 1240 +/- 180 J/mol and Delta S = 62 +/- 10 J/(mol K). Because both these quantities are positive, the equilibrium favors F2NO only at elevated temperatures. This situation is a rare case in which formation of a chemical bond is stabilized only by an increase in the entropy of the system.