Elusive Fluoro Sulfinyl Nitrite, FS(O)NO, Produced by Photolysis of Matrix-isolated FS(O)2N
作者:Xiaoqing Zeng、Helmut Beckers、Patrik Neuhaus、Dirk Grote、Wolfram Sander
DOI:10.1002/zaac.201100396
日期:2012.3
Triplet fluoro sulfonyl nitrene, FS(O)2N (X3A") was generated by ArF excimer laser irradiation (λ = 193 nm) of FS(O)2N3 isolated in solid noble gas matrices. The novel nitrene was characterized by IR (15N-, 18O-, and 34S-labeling), UV/Vis, and EPR spectroscopy. The elusive sulfinyl nitrite, FS(O)NO, was formed in a spin-forbidden reaction upon photolysis (λ > 320 nm) of triplet FS(O)2N. Triplet-singlet
三重氟磺酰基氮烯,FS(O)2N (X3A") 是通过 ArF 准分子激光辐照(λ = 193 nm)在固体惰性气体基质中分离的 FS(O)2N3 产生的。新型氮烯通过 IR (15N- 、18O 和 34S 标记)、UV/Vis 和 EPR 光谱。难以捉摸的亚磺酰基亚硝酸盐 FS(O)NO 是在三重态 FS(O) 光解 (λ > 320 nm) 后的自旋禁止反应中形成的)2N. 三重-单重系统间交叉 (ISC) 被发现与磺酰氮烯的自旋允许碎裂竞争,产生 SO2 + FN (3Σ-) 和 FNO + SO (3Σ-)。在 DFT 计算的指导下,复合物讨论了 FS(O)2N (X3A") 的光分解。