Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions
申请人:——
公开号:US20030198889A1
公开(公告)日:2003-10-23
Photoacid generators comprising sulfonium salt compounds represented by the following general formula (2) wherein R
1
and R
2
represent each an alkyl group optionally having oxo, or R
1
and R
2
may be cyclized together to form an alkylene group optionally having oxo; R
3
, R
4
and R
5
represent each hydrogen or a linear, branched, monocyclic, polycyclic or crosslinked cyclic alkyl group; and Y
−
represents a counter ion.
1