triethylsulfonium trifluoromethanesulfonate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: triethylsulfonium trifluoromethanesulfonate
• 英文别名: Triethylsulfanium;trifluoromethanesulfonate；triethylsulfanium;trifluoromethanesulfonate
• 化学式: CF₃O₃S*C₆H₁₅S
• 分子量: 268.322
• InChiKey: YAXKWHXFRZTYQB-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  1.72
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  66.6
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  乙硫醚 、 2,2,2-三氟乙基三氟甲烷磺酸酯 以 neat (no solvent) 为溶剂， 反应 24.0h， 以27%的产率得到triethylsulfonium trifluoromethanesulfonate
  参考文献：
  名称：

  由硫化物和氟代烷基三氟甲磺酸盐无溶剂合成烷基和氟代烷基sulf盐

  摘要：

  在无溶剂的条件下，由富电子的二芳基硫醚和氟代烷基三氟甲磺酸盐合成了一系列二芳基（氟代烷基）ulf盐。与二芳基硫化物不同，二烷基和烷基（芳基）硫化物与氟代烷基三氟甲烷磺酸盐（例如CF 3 SO 3 CH 2 CF 3，CF 3 SO 3 CH 2 CF 2 H）反应，以高收率提供三烷基和芳基（二烷基）ulf三氟甲烷磺酸盐，其中分别形成二烷基-和烷基（芳基）（氟代烷基）s盐，并被第二硫化物亲核攻击以产生非氟化sulf。在S Ñ2型反应可以在第一步停止，仅提供二烷基和烷基（芳基）（氟代烷基）s盐，这主要取决于硫化物的结构，氟代烷基三氟甲磺酸盐的性质，反应物的比例和/或反应温度。该协议允许高效便捷地访问各种烷基和氟烷基an盐。

  DOI：

  10.1016/j.jfluchem.2016.10.020

文献信息

• Antireflection film composition, patterning process and substrate using the same
  申请人：Shinetsu Chemical Co., Ltd.

  公开号：EP1798599A1

  公开（公告）日：2007-06-20

  There is disclosed an antireflection film composition for forming an intermediate resist film of a multilayer resist film used in lithography comprising: at least a polymer obtained by reacting a chelating agent with a polymer having a repeating unit represented by the following general formula (1); an organic solvent; and an acid generator. There can be provided a novel antireflection film composition that exhibits high etch selection ratio to a photoresist film, that forms a dense inorganic film, whereby an excellent pattern can be formed on the overlying photoresist film, that can be removed with wet stripping, that exhibits high preservation stability and high dry etching resistance when an underlying layer is etched, and that is suitable for forming an intermediate resist film of a multilayer resist film; a patterning process in which an antireflection film is formed over a substrate by using the antireflection film composition; and a substrate having the antireflection film as an intermediate resist film.

  本发明公开了一种用于形成光刻技术中使用的多层光刻胶膜的中间光刻胶膜的抗反射膜组合物，该组合物包括：至少一种通过螯合剂与具有以下通式(1)所代表的重复单元的聚合物反应而得到的聚合物；一种有机溶剂；以及一种酸发生器。本发明提供了一种新型抗反射膜组合物，该组合物对光刻胶膜具有高蚀刻选择比，可形成致密的无机膜，从而可在上覆的光刻胶膜上形成极佳的图案，该组合物可通过湿法剥离去除，当底层被蚀刻时，该组合物具有高保存稳定性和高抗干蚀刻性，并且适用于形成多层抗蚀膜的中间抗蚀膜；使用该抗反射膜组合物在基底上形成抗反射膜的图案化工艺；以及具有该抗反射膜作为中间抗蚀膜的基底。
• 2-cyanoacrylate-based adhesive composition
  申请人：TOAGOSEI CO., LTD.

  公开号：US10793749B2

  公开（公告）日：2020-10-06

  To provide a 2-cyanoacrylate-based adhesive composition not only exhibiting an excellent adhesion rate to a metal and a thermoplastic elastomer low in polarity, but also being excellent in storage stability. A 2-cyanoacrylate-based adhesive composition containing a 2-cyanoacrylic acid ester, and a compound having a sulfur atom-containing heteroallene structure.

  提供一种基于 2-氰基丙烯酸酯的粘合剂组合物，该组合物不仅对金属和低极性热塑性弹性体具有极佳的粘合率，而且还具有极佳的储存稳定性。一种基于 2-氰基丙烯酸酯的粘合剂组合物，含有一种 2-氰基丙烯酸酯和一种具有含硫原子杂环戊烯结构的化合物。
• Antireflective film material, and antireflective film and pattern formation method using the same
  申请人：——

  公开号：US20040253461A1

  公开（公告）日：2004-12-16

  It is an object of the present invention to provide a material for an antireflective film that has high etching selectivity with respect to the resist, that is, that has a faster etching speed than the resist, a pattern formation method for forming an antireflective film layer on a substrate using this antireflective film material, and a pattern formation method using this antireflective film as a hard mask for substrate processing. The present invention provides a silicone resin for preventing reflection comprising an organic group comprising a carbon-oxygen single bond and/or a carbon-oxygen double bond; a light-absorbing group; and a silicon atom whose terminal end or ends are Si—OH and/or Si—OR. It also provides an antireflective film material comprising this silicone resin (A) for preventing reflection film, an organic solvent (B) and an acid generator (C).
• 2-CYANOACRYLATE-BASED ADHESIVE COMPOSITION
  申请人：TOAGOSEI CO., LTD.

  公开号：US20190233679A1

  公开（公告）日：2019-08-01

  To provide a 2-cyanoacrylate-based adhesive composition not only exhibiting an excellent adhesion rate to a metal and a thermoplastic elastomer low in polarity, but also being excellent in storage stability. A 2-cyanoacrylate-based adhesive composition containing a 2-cyanoacrylic acid ester, and a compound having a sulfur atom-containing heteroallene structure.
• US7303785B2
  申请人：——

  公开号：US7303785B2

  公开（公告）日：2007-12-04