申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20160238930A1
公开(公告)日:2016-08-18
A polymer for resist use is obtainable from a hemiacetal compound having formula (1
a
) wherein R
1
is H, CH
3
or CF
3
, R
2
to R
4
each are H or a monovalent hydrocarbon group, X
1
is a divalent hydrocarbon group, ZZ designates a non-aromatic mono- or polycyclic ring of 4 to 20 carbon atoms having a hemiacetal structure, k
1
=0 or 1, and k
2
=0 to 3. A resist composition comprising the polymer displays controlled acid diffusion and low roughness during both positive and negative tone developments.
从具有以下式(1a)的半缩醛化合物获得用于抗蚀的聚合物,其中R1为H、CH3或CF3,R2至R4分别为H或单价碳氢基团,X1为二价碳氢基团,ZZ表示具有半缩醛结构的非芳香性4至20个碳原子的单环或多环环,k1=0或1,k2=0至3。包含该聚合物的抗蚀组合物显示出在正片和负片显影过程中控制酸扩散和低粗糙度。