A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A),
R
1
b
R
2
c
Si (OR
3
)
4-a
(A)
wherein R
1
is a monovalent organic group having at least one unsaturated bond, R
2
individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R
3
individually represents a monovalent organic group, R
1
is a group other than OR
3
, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.
提供一种用于抗反射层底部膜的组合物。该组合物具有出色的储存稳定性,可以形成与光刻胶膜具有良好附着力的抗反射层底部膜,可以提高光刻图案的重复性,并且对于在显影过程中使用的碱性液体和在去除光刻胶时产生的
氧气要求具有耐受性。该组合物包括以下式(A)的
硅烷化合物的
水解物和/或缩合物,R1bR2cSi(OR3)4-a(A),其中R1是至少具有一个不饱和键的单价有机基团,R2分别代表氢原子、卤素原子或单价有机基团,R3分别代表单价有机基团,R1是除OR3之外的基团,a为1至3的整数,b为1至3的整数,c为0至2的整数,但满足a=b+c。