Fluorinated compound, fluoropolymer and method for producing the compound
申请人:Asahi Glass Company, Limited
公开号:US07825275B2
公开(公告)日:2010-11-02
To provide a novel fluorinated compound, a fluoropolymer and a method for producing the compound.
A compound represented by the formula CF2═CFCF2C(X)(C(O)OZ)(CH2)nCR═CHR (wherein X is a hydrogen atom, a cyano group or a group represented by the formula —C(O)OZ, Z is a hydrogen atom or a C1-20 monovalent organic group, n is 0, 1, or 2, and R is a hydrogen atom or a C1-20 monovalent organic group), a method for producing it, and a fluoropolymer obtained by polymerizing the compound.
SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
申请人:ICHIKAWA Koji
公开号:US20120264060A1
公开(公告)日:2012-10-18
A salt represented by formula (I):
wherein Q
1
and Q
2
independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group,
L
1
represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group,
L
2
and L
3
respectively represent a single bond or a C1-C6 divalent saturated alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group,
ring W
1
and ring W
2
respectively represent a C3-C36 hydrocarbon ring,
R
1
and R
2
respectively represent a hydrogen atom or C1-C6 alkyl group,
R
3
represents C1-C6 alkyl group,
t represents an integer of 0 to 2 and
Z
+
represents an organic counter ion
COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
申请人:ICHIKAWA Koji
公开号:US20120295201A1
公开(公告)日:2012-11-22
A compound represented by formula (I):
wherein
T
1
represents a single bond or a C6-C14 aromatic hydrocarbon group,
L
1
represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group,
L
2
and L
3
each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group,
ring W
1
and ring W
2
each independently represent a C3-C36 hydrocarbon ring,
R
1
and R
2
each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group,
R
3
and R
4
each independently represent a hydroxyl group, or C1-C6 alkyl group,
R
5
represents a hydroxyl group or a methyl group,
m represents 0 or 1, and
t and u each independently represent an integer of 0 to 2.
Adamantyl vinyl ether compound and production process for the same
申请人:Idemitsu Petrochemical Co., Ltd.
公开号:EP1486480A1
公开(公告)日:2004-12-15
Provided by the present invention are an adamantyl vinyl ether compound which is useful as a monomer for functional resins in the photolithography field or a raw material therefor and medical and agricultural intermediates and a production process for the same.
The present invention relates to a production process for an adamantyl vinyl ether compound, characterized by subjecting an adamantyl vinyl ether compound having a specific structure and alcohol having an eliminating group in a β position to chloroalkyl-etherification, then subjecting it to etherification to form an adamantyl group-containing ether and then subjecting it to vinyl-etherification.
Adamantane derivative and process for producing the same
申请人:Tanaka Shinji
公开号:US20060149073A1
公开(公告)日:2006-07-06
Provided is an adamantane derivative represented by Formula (I) or (II):
wherein X represents a halogen atom; Y represents an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, a halogen atom or a hetero atom-containing group; R
1
to R
4
represent independently hydrogen, a halogen atom, an alkyl group having 1 to 10 carbon atoms or a halogenated alkyl group having 1 to 10 carbon atoms; m represents an integer of 0 to 15, and n represents an integer of 0 to 10; and excluded is a case where in Formula (I), m and n are 0 at the same time and R
3
and R
4
are a hydrogen atom at the same time.
Capable of being provided is a novel adamantane derivative which is useful as a modifying agent for a resin for a photoresist and a dry etching resistance-improving agent in the photolithography field, agricultural and medical intermediates and other various industrial products.