diphenyl-2,4,6-trimethylphenylsulfonium p-toluenesulfonate | 347841-51-4

• 物质功能分类: 化学试剂 - 有机试剂 - 磺酸盐/亚磺酸盐
• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: diphenyl-2,4,6-trimethylphenylsulfonium p-toluenesulfonate
• 英文别名: Mesityldiphenylsulfonium 4-methylbenzenesulfonate；diphenyl-(2,4,6-trimethylphenyl)sulfanium;4-methylbenzenesulfonate
• CAS: 347841-51-4
• 化学式: C₇H₇O₃S*C₂₁H₂₁S
• 分子量: 476.661
• InChiKey: CZSCUCRXCBAAGX-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  6.61
• 重原子数：
  33
• 可旋转键数：
  3
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  66.6
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  三氟甲磺酸 、 二苯基亚砜 在 三氟乙酸酐 作用下， 以 正己烷 、 均三甲苯 为溶剂， 以84%的产率得到diphenyl-2,4,6-trimethylphenylsulfonium p-toluenesulfonate
  参考文献：
  名称：

  Sulfonium salt compounds

  摘要：

  公开号：

  EP1113005B1

文献信息

• CROSSLINKING AGENT, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING METHOD USING THE NEGATIVE RESIST COMPOSITION
  申请人：Okuyama Kenichi

  公开号：US20120115084A1

  公开（公告）日：2012-05-10

  Disclosed are a negative resist composition which shows excellent sensitivity and resolution in pattern formation by exposure to electron beams or EUV, a novel crosslinking agent suitable for the resist composition, and a pattern forming method using the resist composition. The negative resist composition comprises: (A) a polyphenol compound comprising two or more phenolic hydroxyl groups in a molecule thereof and having a molecular weight of 300 to 3,000, (B) an acid generator which directly or indirectly produces acid by exposure to active energy rays having a wavelength of 248 nm or less, and (C) a crosslinking agent represented by the following chemical formula (1). (The symbols shown in the formula (1) are defined in the Description).

  本发明涉及一种负型光阻组合物，通过暴露于电子束或极紫外线下表现出优异的感光性和分辨率，以及适用于该光阻组合物的新型交联剂和使用该光阻组合物的图案形成方法。该负型光阻组合物包括：（A）一种聚酚化合物，其分子中包含两个或更多酚羟基，并且分子量为300至3,000，（B）一种酸发生剂，通过暴露于波长为248nm或更短的活性能量射线而直接或间接产生酸，以及（C）一种由以下化学式（1）表示的交联剂。（化学式（1）中所示的符号在说明中有定义）。
• PHOTORADIAL- AND PHOTOCATION-CURABLE COMPOSITION
  申请人：Kaneka Corporation

  公开号：EP1947129A1

  公开（公告）日：2008-07-23

  The present invention has its object to provide a photoradical- and photocation-curable composition improved in curability. The present invention relates to a photoradical- and photocation-curable composition which comprises: (A) a vinyl polymer having, per molecule, two or more groups represented by the general formula (1):         -OC(O)C(Ra)=CH2     (1) wherein Ra represents a hydrogen atom or an organic group containing 1 to 20 carbon atoms, at least one of which groups occurs at a molecular terminus, and (B) an epoxy compound and/or oxetane compound and that the N atom-containing compound concentration in the component (A) is not higher than 1,000 ppm and the N atom-containing compound concentration relative to the component (B) is not higher than 2,300 ppm.

  本发明的目的是提供一种可提高固化性的光降解和光致发光固化组合物。 本发明涉及 一种光致抗坏和光致脱落固化组合物，它包括 (A) 乙烯基聚合物，每个分子具有两个或两个以上由通式(1)表示的基团： -OC(O)C(Ra)=CH2(1) 其中 Ra 代表氢原子或含有 1 至 20 个碳原子的有机基团，其中至少一个基团位于分子末端，以及 (B) 环氧化合物和/或氧杂环丁烷化合物，且组分 (A) 中含 N 原子化合物的浓度不高于 1,000 ppm，相对于组分 (B) 含 N 原子化合物的浓度不高于 2,300 ppm。
• SILICA-INCLUDING MICROCAPSULE RESIN PARTICLES, METHOD FOR PRODUCING SAME, AND APPLICATION THEREOF
  申请人：Sekisui Plastics Co., Ltd.

  公开号：EP3424486A1

  公开（公告）日：2019-01-09

  Silica-including microcapsule resin particles including an outer shell constituted of a crosslinked polymer and a cavity partitioned with the outer shell, in which the silica-including microcapsule resin particles contain inside the cavity a porous structure in which silica particles are mutually connected, and have a volume average particle diameter of 0.5 to 100 µm.

  包含二氧化硅的微胶囊树脂颗粒，包括由交联聚合物构成的外壳和与外壳分隔开的空腔，其中包含二氧化硅的微胶囊树脂颗粒在空腔内含有二氧化硅颗粒相互连接的多孔结构，颗粒的体积平均直径为 0.5 至 100 微米。
• NOVEL COMPOUND HAVING ISOCYANURIC SKELETON AND COMPOSITION IN WHICH SAID COMPOUND IS INCLUDED
  申请人：Daikin Industries, Ltd.

  公开号：EP3498756A1

  公开（公告）日：2019-06-19

  The invention aims to provide a novel compound to be suitably used for antifouling agents. The compound of the invention is represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: -(OC6F12)m11-(OC5F10)m12-(OC4F8)m13-(OC3X106)m14-(OC2F4)m15-(OCF2)m16-, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; and the repeating units are present in any order.

  本发明旨在提供一种适用于防污剂的新型化合物。本发明的化合物由下式（1）表示： 其中 R1 是含有聚醚链的单价有机基团；X1 和 X2 分别是单价基团；聚醚链是下式表示的链：-(OC6F12)m11-(OC5F10)m12-(OC4F8)m13-(OC3X106)m14-(OC2F4)m15-(OCF2)m16-，其中 m11、m12、m13、m14、m15 和 m16 分别为 0 或 1 或更大的整数；X10s 分别为 H、F 或 Cl；重复单元以任何顺序存在。
• FUNCTIONAL FILM
  申请人：Daikin Industries, Ltd.

  公开号：EP3514580A1

  公开（公告）日：2019-07-24

  The invention provides a functional film that has a desired microrelief pattern structure, that sufficiently exerts characteristics of a resin serving as a main component for imparting functions to the functional film, and that has an excellent antifouling property, water-repellency, and oil-repellency. The functional film includes a layer (A) that contains a resin and a layer (B) that contains a compound containing a perfluoropolyether group. The layer (B) has a microrelief pattern structure on a surface remote from the layer (A) . In elemental analysis by X-ray photoelectron spectroscopy with etching by an argon gas cluster ion beam from the layer (B) side, the functional film satisfies the following formula (1): D1 < 2 × X1, wherein X1 is a thickness (nm) of the layer (B); and D1 is a depth (nm) at which fluorine atoms exhibit a concentration of 1 atom% or lower. In carbon 1s spectrum measurement by X-ray photoelectron spectroscopy with etching by an argon gas cluster ion beam from the layer (B) side, the functional film satisfies the following formula (2): D2 < 2 × X1, wherein X1 is the thickness (nm) of the layer (B); and D2 is a depth (nm) at which no peak is detected within a bond energy range of 290 to 300 eV.

  本发明提供了一种功能性薄膜，它具有所需的微浮雕图案结构，能充分发挥作为赋予功能性薄膜功能的主要成分的树脂的特性，并具有优异的防污性、憎水性和憎油性。功能薄膜包括含有树脂的层 (A) 和含有全氟聚醚基团化合物的层 (B)。层（B）在远离层（A）的表面上具有微凹凸图案结构。用 X 射线光电子能谱进行元素分析时，用氩气簇离子束从层（B）一侧进行蚀刻，功能膜满足下式（1）：D1 < 2 × X1，其中 X1 是层（B）的厚度（纳米）；D1 是氟原子浓度为 1 原子%或更低的深度（纳米）。在用 X 射线光电子能谱测量碳 1s 光谱时，用氩气簇离子束从层（B）侧进行蚀刻，功能膜满足下式（2）：D2 < 2 × X1，其中 X1 是层（B）的厚度（纳米）；D2 是在 290 至 300 eV 的键能范围内检测不到峰值的深度（纳米）。