2,3,4,4'-tetrahydroxybenzophenone 1,2-naphthoquinonediazide-5-sulfonate ester

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,3,4,4'-tetrahydroxybenzophenone 1,2-naphthoquinonediazide-5-sulfonate ester
• 英文别名: [4-(2,3,4-Trihydroxybenzoyl)phenyl] 7,8-diazido-5,6-dioxonaphthalene-1-sulfonate
• 化学式: C₂₃H₁₂N₆O₉S
• 分子量: 548.449
• InChiKey: RCAVTSSBCNOLTI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.2
• 重原子数：
  39
• 可旋转键数：
  7
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  192
• 氢给体数：
  3
• 氢受体数：
  13

反应信息

• 作为产物：
  描述：

  1,2-naphthoquinone diazide-5-sulfonyl chloride 、 2,3,4,4'-四羟基二苯甲酮 在 盐酸 、 三乙胺 作用下， 以 四氢呋喃 为溶剂， 生成 2,3,4,4'-tetrahydroxybenzophenone 1,2-naphthoquinonediazide-5-sulfonate ester
  参考文献：
  名称：

  Method for producing 1,2-naphthoquinonediazide photosensitive agent

  摘要：

  一种生产高纯度的1,2-萘醌二氮化酯感光剂的方法，其中含有低水平的杂质，通过在除酰胺以外的有机溶剂中，将多羟基酚类化合物和1,2-萘醌二氮化酯磺酸氯化物在有机胺的存在下缩合；随后向所得反应混合物中加入酰胺溶剂；并通过过滤分离产生的有机胺酸盐。

  公开号：

  US20010049433A1

文献信息

• Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures
  申请人：OCG MICROELECTRONIC MATERIALS, INC.

  公开号：EP0561625A1

  公开（公告）日：1993-09-22

  A radiation-sensitive composition comprises an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one polylactide compound; the amount of said binder resin being about 60 to 95% by weight, the amount of said photoactive component being about 5% to about 40% by weight, based on the total solids content of said radiation-sensitive compostion.

  一种辐射敏感性组合物包括以下物质在溶剂中的混合物：至少一种碱溶性粘合剂树脂、至少一种光活性化合物和有效提高敏感性的至少一种聚乳酸化合物；根据所述辐射敏感性组合物的总固体含量，所述粘合剂树脂的含量约为 60% 至 95%（按重量计），所述光活性成分的含量约为 5%至 40%（按重量计）。
• High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions
  申请人：OCG MICROELECTRONIC MATERIALS, INC.

  公开号：EP0623633A2

  公开（公告）日：1994-11-09

  A phenolic novolak composition prepared by a process characterized by the steps of: (1) reacting a first phenolic monomer comprising a major portion of at least one trifunctional phenolic monomer with a first aldehyde source in the absence of a catalyst at a reaction temperature from about 100°C to about 200°C and at a reaction pressure of about 2 to about 15 atmospheres to form a phenolic oligomer having a weight average molecular weight from about 500 to about 2,000, having ortho-ortho bonding of about 55% to about 75% of the methylene bonds between the phenolic moieties; and having a time to clear of less than 125 seconds per micron; wherein the mole ratio of said first aldehyde source to said first phenolic monomer is from about 0.3:1.0 to about 0.55:1.0; and (2) then reacting said oligomer with an optional second phenolic source and a second aldehyde source at a temperature from about 80°C to about 150°C to form a phenolic novolak having a weight average molecular weight of 3,000 to 40,000, having ortho-ortho bonding of between 50% and 70% of the methylene bonds between the phenolic moieties, and having a time to clear of at least 20 seconds per micron; wherein the mole ratio of said second aldehyde source to said total phenolic moieties is less than about 0.8:1.0.

  一种酚醛树脂组合物，其制备过程包括以下步骤 (1) 在没有催化剂的情况下，在反应温度约为 100°C 至约 200°C，反应压力约为 2 至约 15 个大气压的条件下，使包含至少一种三官能酚类单体的主要部分的第一酚类单体与第一醛源反应，以形成酚类低聚物，该酚类低聚物的重量平均分子量约为 500 至约 2,000，酚基之间的亚甲基键的正交键合率约为 55% 至约 75%；其中所述第一醛源与所述第一酚单体的摩尔比为约 0.3:1.0至约0.55:1.0；以及 (2) 然后将所述低聚物与任选的第二酚源和第二醛源在约80℃至约150℃的温度下反应，以形成酚醛新酯，其重量平均分子量为3,000至40,000，酚基之间50%至70%的亚甲基键为正交键，且每微米的透明时间至少为20秒；其中所述第二醛源与所述酚基总量的摩尔比小于约0.8:1.0。
• Radiation-sensitive resin composition
  申请人：JAPAN SYNTHETIC RUBBER CO., LTD.

  公开号：EP0443820B1

  公开（公告）日：1998-09-09
• THERMALLY STABLE PHENOLIC RESIN COMPOSITIONS AND THEIR USE IN LIGHT-SENSITIVE COMPOSITIONS
  申请人：OCG MICROELECTRONIC MATERIALS, INC.

  公开号：EP0424464B1

  公开（公告）日：1994-05-04
• EP0424464A4
  申请人：——

  公开号：EP0424464A4

  公开（公告）日：1991-09-25