1,2-naphthoquinone diazide-5-sulfonyl chloride

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1,2-naphthoquinone diazide-5-sulfonyl chloride
• 英文别名: 1,2-naphthoquinonediazide-5-sulfonyl chloride；1,2-naphthoquinonediazidesulfonyl chloride；[(8-Chlorosulfonyl-1-diazonioimino-3,4-dioxonaphthalen-2-ylidene)hydrazinylidene]azanide
• 化学式: C₁₀H₃ClN₆O₄S
• 分子量: 338.691
• InChiKey: UZPHHDOOAKYGMS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  22
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  143
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为反应物：
  描述：

  1,2-naphthoquinone diazide-5-sulfonyl chloride 、 2,3,4-三羟基二苯甲酮 在 盐酸 、 三乙胺 作用下， 以 丙酮 为溶剂， 生成 2,3,4-trihydroxybenzophenone 1,2-naphthoquinonediazide-5-sulfonate ester
  参考文献：
  名称：

  Method for producing 1,2-naphthoquinonediazide photosensitive agent

  摘要：

  一种生产高纯度的1,2-萘醌二氮化酯感光剂的方法，其中含有低水平的杂质，通过在除酰胺以外的有机溶剂中，将多羟基酚类化合物和1,2-萘醌二氮化酯磺酸氯化物在有机胺的存在下缩合；随后向所得反应混合物中加入酰胺溶剂；并通过过滤分离产生的有机胺酸盐。

  公开号：

  US20010049433A1

文献信息

• Photosensitive compound, photosensitive composition including the same, method of manufacturing the same
  申请人：Korea Kumho Petrochemical Co., Ltd.

  公开号：EP2289874A1

  公开（公告）日：2011-03-02

  Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.

  揭示了一种光敏化合物及其制造方法。该光敏化合物由至少含有一个萘醌二氮化苯并磺酸酯基团的化合物组成，该化合物在一个分子中具有至少一个含有1至8个碳原子的羧基或至少一个含有1至8个碳原子的烷氧基。
• Photosensitive Compound and Photosensitive Composition Including the Same
  申请人：Park Joo Hyeon

  公开号：US20110053084A1

  公开（公告）日：2011-03-03

  Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.

  揭示了一种感光化合物及其制造方法。该感光化合物由至少含有一个萘醌二氮化硫酸酯基团的萘醌二氮化硫酸酯化合物组成，并且在一个分子中具有至少一个含有1至8个碳原子的羧基或至少一个含有1至8个碳原子的烷氧基。
• NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190169211A1

  公开（公告）日：2019-06-06

  The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).

  本发明是基于本文中的情况而作出的。本发明的目的是提供：一种四羧酸二酐，可导致聚酰亚胺，作为感光树脂组合物的基树脂，能够形成细微图案并获得高分辨率，同时不损害优异的特性，如机械强度和粘附性；通过使用该四羧酸二酐获得的聚酰亚胺树脂；以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式（1）所示。
• COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20190010108A1

  公开（公告）日：2019-01-10

  The present invention employs a compound represented by the following formula (0): wherein R Y is a linear, branched, or cyclic alkyl group of 1 to 30 carbon atoms or an aryl group of 6 to 30 carbon atoms; R Z is an N-valent group of 1 to 60 carbon atoms or a single bond; each R T is independently an alkyl group of 1 to 30 carbon atoms optionally having a substituent, an aryl group of 6 to 40 carbon atoms optionally having a substituent, an alkenyl group of 2 to 30 carbon atoms optionally having a substituent, an alkoxy group of 1 to 30 carbon atoms optionally having a substituent, a halogen atom, a nitro group, an amino group, a cyano group, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group, wherein the alkyl group, the alkenyl group, and the aryl group each optionally contain an ether bond, a ketone bond, or an ester bond, wherein at least one R T is a hydroxy group or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group; X is an oxygen atom, a sulfur atom, or not a crosslink; each m is independently an integer of 0 to 9, wherein at least one m is an integer of 1 to 9; N is an integer of 1 to 4, wherein when N is an integer of 2 or larger, N structural formulas within the parentheses [ ] are the same or different; and each r is independently an integer of 0 to 2.

  本发明采用以下式（0）所代表的化合物：其中RY是1到30个碳原子的直链、支链或环烷基基团，或者是6到30个碳原子的芳基基团；RZ是1到60个碳原子的N价基团或者是一个单键；每个RT独立地是1到30个碳原子的烷基基团，可选地带有取代基，是6到40个碳原子的芳基基团，可选地带有取代基，是2到30个碳原子的烯基基团，可选地带有取代基，是1到30个碳原子的烷氧基基团，可选地带有取代基，是卤素原子、硝基基团、氨基基团、氰基基团、硫醇基团、羟基或者羟基的氢原子被酸解离基团取代的基团，其中烷基基团、烯基基团和芳基基团每个可选地包含醚键、酮键或酯键，其中至少一个RT是羟基或者羟基的氢原子被酸解离基团取代的基团；X是氧原子、硫原子或者不是交联；每个m独立地是0到9的整数，其中至少一个m是1到9的整数；N是1到4的整数，当N是2或更大的整数时，括号中的N个结构式是相同或不同的；每个r独立地是0到2的整数。
• COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210070727A1

  公开（公告）日：2021-03-11

  The present invention provides a compound represented by following formula (0):

  本发明提供了以下式（0）表示的化合物。