The present invention relates to a semiconductor device using a copolymer-containing photoresist, and a process for manufacturing the same. As a norbornene derivative (monomer) having a hydrophilic group is synthesized and introduced to the backbone chain of a polymer, the polymer according to the present invention has excellent etching resistance and heat resistance, which are the characteristic points of alicyclic olefin structure, and provide excellent resolution due to prominent enhancement of adhesiveness resulted from introducing a hydrophilic group (—OH).
本发明涉及一种使用共聚物含有的光阻的半导体器件及其制造方法。通过合成具有亲
水基的
萘并衍
生物(单体)并将其引入聚合物的骨架链中,本发明的聚合物具有杂环烯烃结构的特点,具有优异的蚀刻抗性和耐热性,并由于引入亲
水基(—OH)而显着提高了粘附性,从而提供了优异的分辨率。