AlCl3-[C4mim](1+)Cl(1-) (58:42) melt

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑类
• 英文名称: AlCl3-[C4mim](1+)Cl(1-) (58:42) melt
• 英文别名: Aluminum;1-butyl-3-methylimidazol-3-ium;tetrachloride
• 化学式: 58AlCl₃*42C₈H₁₅N₂*42Cl
• 分子量: 15070.0
• InChiKey: PNOZWIUFLYBVHH-UHFFFAOYSA-J

计算性质

• 辛醇/水分配系数(LogP)：
  -0.2
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  8.8
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  蒽 、 AlCl3-[C4mim](1+)Cl(1-) (58:42) melt 以 further solvent(s) 为溶剂， 生成 (anthracenium)AlCl3(AlCl4)(1-butyl-3-methylimidazolium)
  参考文献：
  名称：

  通过双重活化来氢化芳烃：在环境条件下将底物从苯还原为C60富勒烯。

  摘要：

  DOI：

  10.1002/anie.200803850
• 作为产物：
  描述：

  三氯化铝 、 氯化(1-丁基-3-甲基咪唑) 以 not given 为溶剂， 生成 AlCl3-[C4mim](1+)Cl(1-) (58:42) melt
  参考文献：
  名称：

  Nanoscale electrodeposition of Al on n-Si(111):H from an ionic liquid

  摘要：

  The H-terminated Si(1 1 1)/ionic liquid interface has been imaged by scanning tunneling microscopy (STM) for the first time. Employing the ionic liquid AJCl(3)-[C(4)mim](+) nanoscale electrodeposition of Al on Si(1 1 1):H substrates has been investigated by in situ electrochemical scanning probe techniques at room temperature. No underpotential deposition of A] is found. Nucleation of Al begins at the Nernst potential with the formation of large islands spread all over the substrate. Under the influence of the scanning STM tip, these islands are easily disturbed which makes it difficult to image the initial stages of electrochemical phase formation. We explain this by a relatively high mobility of the islands due to the poor wetting of Al on the Si(1 11): H substrate. The 3D growth of Al on Si(1 11): H follows a Volmer-Weber growth mode. Scanning tunneling spectra of larger Al clusters show clearly metallic characteristics. (c) 2006 Elsevier B.V. All rights reserved.

  DOI：

  10.1016/j.cplett.2006.12.012

文献信息

• Nanoscale electrodeposition of Al on n-Si(111):H from an ionic liquid
  作者：C.L. Aravinda、B. Burger、W. Freyland

  DOI：10.1016/j.cplett.2006.12.012

  日期：2007.2

  The H-terminated Si(1 1 1)/ionic liquid interface has been imaged by scanning tunneling microscopy (STM) for the first time. Employing the ionic liquid AJCl(3)-[C(4)mim](+) nanoscale electrodeposition of Al on Si(1 1 1):H substrates has been investigated by in situ electrochemical scanning probe techniques at room temperature. No underpotential deposition of A] is found. Nucleation of Al begins at the Nernst potential with the formation of large islands spread all over the substrate. Under the influence of the scanning STM tip, these islands are easily disturbed which makes it difficult to image the initial stages of electrochemical phase formation. We explain this by a relatively high mobility of the islands due to the poor wetting of Al on the Si(1 11): H substrate. The 3D growth of Al on Si(1 11): H follows a Volmer-Weber growth mode. Scanning tunneling spectra of larger Al clusters show clearly metallic characteristics. (c) 2006 Elsevier B.V. All rights reserved.
• Hydrogenation of Arenes by Dual Activation: Reduction of Substrates Ranging from Benzene to C₆₀Fullerene under Ambient Conditions
  作者：Ravindra R. Deshmukh、Ji Woong Lee、Ueon Sang Shin、Jin Yong Lee、Choong Eui Song

  DOI：10.1002/anie.200803850

  日期：2008.10.27