4,4-dimethoxybiphenyl

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 4,4-dimethoxybiphenyl
• 英文别名: 3,3-Dimethoxy-6-phenylcyclohexa-1,4-diene
• 化学式: C₁₄H₁₆O₂
• 分子量: 216.28
• InChiKey: GXCVWTYYBJVIEA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  2,2'-联吡啶 、 4-氯苯甲醚 在 nickel dichloride sodium iodide 、 三苯基膦 作用下， 以80%的产率得到4,4-dimethoxybiphenyl
  参考文献：
  名称：

  Coupling of aryl and heteroaryl monochlorides

  摘要：

  公开号：

  EP0012201B2

文献信息

• Polymerisable compositions, derived coatings and other polymerised products
  申请人：IMPERIAL CHEMICAL INDUSTRIES PLC

  公开号：EP0010897A2

  公开（公告）日：1980-05-14

  Photopolymerisable compositions capable of polymerisation by an acid-catalysed mechanism under the influence of ultraviolet and/or visible light comprise (a) at least one material capable of polymerisation by an acid-catalysed mechanism to a polymeric material of higher molecular weight state, (b) a photosensitive aromatic halonium salt and (c) a material which under the conditions of photopolymerisation will yield a significant proportion of free radicals. These compositions yield useful coating films and other products on irradiation.

  在紫外线和/或可见光的影响下，能够通过酸催化机制进行聚合的可光聚合组合物包括：(a) 至少一种能够通过酸催化机制聚合成较高分子量状态的聚合材料的材料；(b) 一种光敏芳香族卤化盐；(c) 一种在光聚合条件下会产生大量自由基的材料。 这些组合物在辐照下可产生有用的涂膜和其他产品。
• Polyaromatic compounds
  申请人：IMPERIAL CHEMICAL INDUSTRIES PLC

  公开号：EP0206543A2

  公开（公告）日：1986-12-30

  A halogen containing compound is coupled in the presence of carbon monoxide, an alkaline medium and a supported palladium catalyst. The reaction is preferably effected at elevated temperature and pressure, for example 80°C to 200°C and 0.2 to 3MNm-1. The alkaline medium can be aqueous sodium hydroxide solution. The support of the supported palladium catalyst may be calcium carbonate or charcoal. The halogen containing aromatic compound can be, for example, chlorobenzene; 4-chlorotoluene; 4-methoxychlorobenzene; 4-chlorophenol; 4-chlorobenzoic acid; 4-chloro-4'-hydroxybenzophenone; 4-bromobenzoic acid; 4-bromophenol; 2-chlorotoluene; 2-hydroxy-5-chlorobenzoic acid or 2-chloropyridine. Some of the resulting compounds or derivatives thereof are novel, such as 4,4'-bis(4-acetoxybenzoyl) biphenyl.

  含卤化合物在一氧化碳、碱性介质和支撑钯催化剂的存在下进行偶联反应。反应最好在高温高压下进行，例如 80°C 至 200°C 和 0.2 至 3MNm-1。碱性介质可以是氢氧化钠水溶液。支撑钯催化剂的载体可以是碳酸钙或木炭。含卤素的芳香族化合物可以是氯苯、4-氯甲苯、4-甲氧基氯苯、4-氯苯酚、4-氯苯甲酸、4-氯-4'-羟基二苯甲酮、4-溴苯甲酸、4-溴苯酚、2-氯甲苯、2-羟基-5-氯苯甲酸或 2-氯吡啶等。由此产生的一些化合物或其衍生物很新颖，如 4,4'-双（4-乙酰氧基苯甲酰基）联苯。
• A process of producing a polyimide block copolymer
  申请人：JAPAN SYNTHETIC RUBBER CO., LTD.

  公开号：EP0725302A2

  公开（公告）日：1996-08-07

  A polyamide-type copolymer, a process of producing the same and use of the same in a thin layer forming agent. In order to provide a polyamide-type copolymer suitable for producing an alignment layer in an SBE type display element with high transparency, adhesion, pretilt angle etc, the present invention provides processes of producing a block copolymer type polyamic acid, a polyimide block copolymer, a polyimide-polyamic acid block copolymer and a liquid crystal alignment layer wherein, in separate steps, first and second prepolymers comprising polyamic acid prepolymers or polyamide prepolymers are prepared and subsequently reacted together, and if necessary, imidised. The invention also provides a thin layer forming agent having a first polyimide-type block and a second polyimide-type block bonded to the first polyimide-type block and having a different structure from the first polyimide type block.

  一种聚酰胺型共聚物、其生产工艺以及其在薄层成型剂中的用途。 为了提供一种聚酰胺型共聚物，使其适用于在 SBE 型显示元件中生产具有高透明 度、高附着力和高前倾角等特性的对位层，本发明提供了生产聚酰胺型嵌段共聚物、 聚酰亚胺嵌段共聚物、聚酰亚胺-聚酰胺嵌段共聚物和液晶对位层的工艺，其中，在 不同步骤中，制备了由聚酰胺预聚物或聚酰胺预聚物组成的第一和第二预聚物， 然后将它们反应在一起，必要时进行亚胺化。 本发明还提供了一种薄层形成剂，它具有第一聚酰亚胺型嵌段和与第一聚酰亚胺型嵌段粘合在一起的第二聚酰亚胺型嵌段，其结构与第一聚酰亚胺型嵌段不同。
• FILM AND APPLICATION THEREOF
  申请人：Mitsui Chemicals, Inc.

  公开号：EP2500372A1

  公开（公告）日：2012-09-19

  Disclosed is a film composed of a resin having a thiourethane bond, wherein the molar ratio (S/N) of sulfur to nitrogen contained in the resin is equal to or more than 0.8 and less than 3. According to the present invention, the film is excellent in a balance among high refractive index, low birefringence and light transmittance, and further excellent in a balance of mechanical characteristics such as toughness, hardness and dimensional stability, so that effects of deformation and the like during processing are very small, and the film is further excellent in solvent resistance as well.

  本发明公开了一种由具有硫代氨基甲酸乙酯键的树脂构成的薄膜，其中树脂中所含的硫与氮的摩尔比（S/N）等于或大于 0.8，小于 3。根据本发明，该薄膜在高折射率、低双折射和透光率之间的平衡性极佳，而且在韧性、硬度和尺寸稳定性等机械特性之间的平衡性也极佳，因此在加工过程中的变形等影响非常小，而且该薄膜的耐溶剂性也极佳。
• PROCESS FOR PRODUCING MICROFLUIDIC ARTICLES
  申请人：3M Innovative Properties Company

  公开号：EP1295180A2

  公开（公告）日：2003-03-26