N-(tert-butyloxycarbonyl)-L-isoleucine methyl ester

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: N-(tert-butyloxycarbonyl)-L-isoleucine methyl ester
• 英文别名: N-t-butoxycarbonyl-L-isoleucine methyl ester；N-Boc-L-isoleucine methyl ester；N-(tert.-butyloxycarbonyl)-L-isoleucine methyl ester；N-(t-butyloxycarbonyl)-L-isoleucine methyl ester；Methyl (2S)-2-[(tert-butoxycarbonyl)amino]-3-methylpentanoate；methyl (2S)-3-methyl-2-[(2-methylpropan-2-yl)oxycarbonylamino]pentanoate
• 化学式: C₁₂H₂₃NO₄
• 分子量: 245.319
• InChiKey: KLRYBAAAYDFIEQ-GKAPJAKFSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  17
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  64.6
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  N-(tert-butyloxycarbonyl)-L-isoleucine methyl ester 在 锂硼氢 作用下， 以 四氢呋喃 、 乙醇 为溶剂， 生成 N-(tert-butyloxycarbonyl)-L-isoleucinol
  参考文献：
  名称：

  Wyslouch, Aleksandra; Lisowski, Marek; Siemion, Ignacy Z., Bulletin of the Polish Academy of Sciences: Chemistry, 1994, vol. 42, # 1, p. 117 - 130

  摘要：

  DOI：
• 作为产物：
  描述：

  methyl L-isoleucinate 生成 N-(tert-butyloxycarbonyl)-L-isoleucine methyl ester
  参考文献：
  名称：

  OTTENHEIJM, HENRICUS C. J.

  摘要：

  DOI：

文献信息

• Deprotection/reprotection of the amino group in α-amino acids and peptides. A one-pot procedure in [Bmim][BF₄] ionic liquid
  作者：M. L. Di Gioia、A. Barattucci、P. Bonaccorsi、A. Leggio、L. Minuti、E. Romio、A. Temperini、C. Siciliano

  DOI：10.1039/c3ra46599c

  日期：——

  of the α-amino group in α-amino acid and dipeptide methyl esters. [Bmim][BF4] is used as the solvent in the entire process. In particular, the use of the ionic liquid allows for rapid and clean removal of the 4-nitrobenzenesulfonyl (nosyl) group and for facile subsequent tert-butyloxycarbonylation of the free α-amino function under very mild conditions. N-Boc-α-amino acid as well as peptide derivatives

  本文提出了一种有效的一锅法，用于依次对α-氨基酸和二肽甲酯中的α-氨基进行脱保护/再保护。在整个过程中，[Bmim] [BF 4 ]被用作溶剂。特别地，离子液体的使用允许在非常温和的条件下快速和干净地除去4-硝基苯磺酰基（nosyl）基团，并且随后易于进行游离α-氨基官能团的叔丁氧基羰基化。分离N -Boc-α-氨基酸以及肽衍生物的产率很高，不需要进一步纯化。在此过程中，前体的绝对构型被完全保留。
• Synthesis of Chiral, Enantiopure Allylic Amines by the Julia Olefination of α-Amino Esters
  作者：Fabio Benedetti、Federico Berti、Lidia Fanfoni、Michele Garbo、Giorgia Regini、Fulvia Felluga

  DOI：10.3390/molecules21060805

  日期：——

  The four-step conversion of a series of N-Boc-protected l-amino acid methyl esters into enantiopure N-Boc allylamines by a modified Julia olefination is described. Key steps include the reaction of a lithiated phenylalkylsulfone with amino esters, giving chiral β-ketosulfones, and the reductive elimination of related α-acetoxysulfones. The overall transformation takes place under mild conditions, with

  描述了通过改进的 Julia 烯化将一系列 N-Boc 保护的 l-氨基酸甲酯转化为对映纯 N-Boc 烯丙胺的四步转化。关键步骤包括锂化苯基烷基砜与氨基酯的反应，产生手性 β-酮砜，以及相关 α-乙酰氧基砜的还原消除。整个转化过程在温和条件下进行，收率良好，且不损失立体化学完整性，在这方面优于 α-氨基醛的常规 Julia 反应。
• Sparsomicin (Sc-Rs) compounds having antitumor activity, a process for their preparation and pharmaceutical compositions containing sparsomycin (Sc-Rs) compounds
  申请人：Stichting Katholieke Universiteit

  公开号：EP0324993A1

  公开（公告）日：1989-07-26

  The invention relates to novel sparsomycin (Sc-Rs) compounds having valuable antitumor activity, and to a process for their preparation and pharmaceutical compositions containing such novel compounds. The novel compounds satisfy the general formula

  这项发明涉及具有有价值的抗肿瘤活性的新型斯帕索霉素（Sc-Rs）化合物，以及用于其制备的过程和含有这种新型化合物的药物组合物。这些新型化合物符合一般公式。
• Sparsomycin (SC-RS) compounds having antitumor activity, a process for
  申请人：Stichting Katholieke Universiteit

  公开号：US04820712A1

  公开（公告）日：1989-04-11

  The invention relates to novel sparsomycin (S.sub.c -R.sub.s) compounds having valuable antitumor activity, and to a process for their preparation and pharmaceutical compositions containing such novel compounds. The novel compounds satisfy the general formula ##STR1##

  这项发明涉及具有有价值的抗肿瘤活性的新型斯帕索霉素（S.sub.c -R.sub.s）化合物，以及其制备方法和含有这种新型化合物的药物组合物。新型化合物符合以下一般公式：##STR1##
• CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
  申请人：OSAKA UNIVERSITY

  公开号：US20170052449A1

  公开（公告）日：2017-02-23

  A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray that is nonionizing radiation having a wavelength greater than the wavelength of the nonionizing radiation for the patternwise exposing and greater than 200 nm. The chemically amplified resist material comprises a base component, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The generative component comprises a radiation-sensitive sensitizer generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (A).

  一种图案形成方法包括将一种化学放大型光刻胶材料制成的感光树脂组成物的预定区域图案暴露于第一种放射性射线中，该放射性射线是电离辐射或波长不大于400 nm的非电离辐射。图案化暴露的光刻胶材料膜被洪水式暴露于第二种放射性射线中，该放射性射线是波长大于图案化暴露的非电离辐射的波长和大于200 nm的非电离辐射。该化学放大型光刻胶材料包括基础组分和能够在暴露时生成辐射敏感的敏化剂和酸的生成组分。生成组分包括辐射敏感的敏化剂生成剂。辐射敏感的敏化剂生成剂包括由式(A)表示的化合物。