HIGH-K DIELECTRIC FILMS AND METHODS OF PRODUCING USING CERIUM-BASED BETA-DIKETONATE PRECURSORS
申请人:Chalker Paul Raymond
公开号:US20110165401A1
公开(公告)日:2011-07-07
Methods are provided to form and stabilize high-κ dielectric films by chemical phase deposition processes using metal-source precursors and cerium-based β-diketonate precursors according to Formula I: Ce(L)
x
(Formula I) wherein: L is a β-diketonate; and x is 3 or 4. Further provided are methods of improving high-κ gate property of semiconductor devices by using cerium precursors according to Formula I. High-κ dielectric films are also provided comprising hafnium oxide, titanium oxide or mixtures thereof, and further containing a permittivity maintaining or increasing amount of cerium atoms.