2-(Aminoaryl)indoles and indolines, a process for their preparation and their use as medicaments
申请人:HOECHST-ROUSSEL
PHARMACEUTICALS INCORPORATED
公开号:EP0406734A2
公开(公告)日:1991-01-09
There are described compounds of the formula
where
A is CH or N;
X is hydrogen, loweralkyl, halogen, trifluromethyl, loweralkoxy, arylloweralkoxy, hydroxy or phenylamino;
Y is hydrogen, loweralkyl, halogen, loweralkoxy, arylloweralkoxy or hydroxy;
R1 is hydrogen or loweralkyl;
R2 is hydrogen, loweralkyl, formyl, alkylcarbonyl, arylloweralkylcarbonyl, arylcarbonyl, alkoxycarbonyl, arylloweralkoxycarbonyl or aryloxycarbonyl;
R3 is hydrogen, alkyl, alkylcarbonyl, arylloweralkylcarbonyl, arylcarbonyl, alkoxycarbonyl, arylloweralkoxycarbonyl, aryloxycarbonyl or -CH2CO2C2H5;
which compounds are useful as topical antiinflammatory agents for the treatment of skin disorders, and a process for their preparation.
所述化合物的化学式为
式中
A 是 CH 或 N
X 是氢、低级烷基、卤素、三氟甲基、低级烷氧基、芳基低级烷氧基、羟基或苯基氨基;
Y 是氢、低级烷基、卤素、低级烷氧基、芳基低级烷氧基或羟基;
R1 是氢或低级烷基
R2 是氢、低级烷基、甲酰基、烷基羰基、芳基低级烷基羰基、芳基羰基、烷氧基羰基、芳基低级烷氧基羰基或芳基氧基羰基;
R3 是氢、烷基、烷基羰基、芳低级烷基羰基、芳基羰基、烷氧基羰基、芳低级烷氧基羰基、芳氧基羰基或 -CH2CO2C2H5;
这些化合物可用作治疗皮肤病的局部消炎剂,以及制备这些化合物的工艺。