β-acryloyloxy-γ-butyrolactone

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: β-acryloyloxy-γ-butyrolactone
• 英文别名: 5-Oxotetrahydrofuran-3-yl acrylate；(5-oxooxolan-3-yl) prop-2-enoate
• 化学式: C₇H₈O₄
• 分子量: 156.138
• InChiKey: NLFBWKWLKNHTDC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.4
• 重原子数：
  11
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.43
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  (±)-3-羟基-r-丁内酯 、 丙烯酰氯 在 吡啶 作用下， 以 正己烷 为溶剂， 反应 10.0h， 生成 β-acryloyloxy-γ-butyrolactone
  参考文献：
  名称：

  3-丙烯酸酯-4-丁内酯的纯化方法

  摘要：

  本发明提供了一种3‑丙烯酸酯‑4‑丁内酯的纯化方法。所述纯化方法包括如下步骤：将所述3‑丙烯酸酯‑4‑丁内酯粗品进行硅胶层析吸附纯化处理，获得吸附纯化3‑丙烯酸酯‑4‑丁内酯；将所述吸附纯化3‑丙烯酸酯‑4‑丁内酯采用次氯酸钠溶液进行氧化处理，获得混合物；将所述混合物进行除水处理；将经除水处理后的所述3‑丙烯酸酯‑4‑丁内酯进行精馏处理。本发明3‑丙烯酸酯‑4‑丁内酯纯化通过吸附、氧化、除水、精馏工艺纯化处理，使得最终3‑丙烯酸酯‑4‑丁内酯单体纯度能够达到99.999％(5N)以上，使得纯化获得的3‑丙烯酸酯‑4‑丁内酯单体完全达到集成电路制造的要求。

  公开号：

  CN111978275B

文献信息

• Salt suitable for an acid generator and a chemically amplified resist composition containing the same
  申请人：Harada Yukako

  公开号：US20070078269A1

  公开（公告）日：2007-04-05

  The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH 2 — group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q 1 and Q 2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A + represents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

  本发明提供了一种具有公式(I)的盐： 其中环Y代表具有3至30个碳原子的单环或多元环烃基团，其中一个—CH2—基团被—COO—基团取代，并且单环或多元环烃基团中的至少一个氢原子可以可选地被具有1至6个碳原子的烷基取代，具有1至6个碳原子的烷氧基，具有1至4个碳原子的全氟烷基，具有1至6个碳原子的羟基烷基，羟基或腈基；Q1和Q2各自独立地代表氟原子或具有1至6个碳原子的全氟烷基；A+代表有机反离子；n表示0至12的整数。 本发明还提供了一种含有公式(I)盐的化学放大抗蚀剂组合物。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：ICHIKAWA Koji

  公开号：US20100304293A1

  公开（公告）日：2010-12-02

  A salt represented by the formula (a): wherein Q 1 and Q 2 each independently represent a fluorine atom etc., X 1 represents a single bond etc., X 2 represents a single bond etc., Y 1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X 2 —Y 1 group has one or more fluorine atoms, and Z + represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

  由公式(a)表示的盐：其中Q1和Q2各自独立代表氟原子等，X1代表单键等，X2代表单键等，Y1代表C3-C6的脂环烃基等，但条件是—X2—Y1基团具有一个或多个氟原子，以及Z+代表有机反离子，以及包含由公式(a)表示的盐的光阻剂组合物和包含具有酸不稳定的基团并且在水性碱液中不溶或微溶于但在酸性作用下水性碱液中变得可溶的树脂的结构单元。
• Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Shigematsu Junji

  公开号：US20080086014A1

  公开（公告）日：2008-04-10

  The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH 2 — in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH 2 — in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A + represents an organic counter ion.

  本发明提供了一种由公式(I)表示的盐：其中X代表含至少一个二价脂环烃基的C3-C30二价基团，并且C3-C30二价基团中的至少一个—CH2—可以被—O—或—CO—取代，Y代表一个C3-C30环烃基，该环烃基可以至少被选自C1-C6烷氧基、C1-C4全氟烷基、C1-C6羟基烷基、羟基和氰基的至少一个取代基取代，并且C3-C30环烃基中的至少一个—CH2—可以被—O—或—CO—取代，Q1和Q2各自独立地代表一个氟原子或一个C1-C6全氟烷基，以及A+代表一个有机反离子。
• Chemical amplification type resist composition
  申请人：Yamada Airi

  公开号：US20080269506A1

  公开（公告）日：2008-10-30

  The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

  本发明提供了一种公式(Ia)的硫鎓盐，包括一个结构单元的聚合物化合物的公式(Ib)，以及一种化学放大型正性光刻胶组合物，包括(A)至少选择自硫鎓盐的公式(Ia)、一个结构单元的聚合物化合物的公式(Ib)和硫鎓盐的公式(Ic)组成的酸发生剂；以及(B)含有酸敏感基团的结构单元的树脂，本身在碱性水溶液中不溶或难溶，但在酸的作用下变得可溶于碱性水溶液。
• FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210341839A1

  公开（公告）日：2021-11-04

  A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone.

  提供一种含有氟羧酸的聚合物，其中包含具有式（A1）的重复单元，但不含有酸不稳定的重复单元。包含该聚合物的抗蚀剂组合物具有高灵敏度，并且无论是正向还是负向调色板，都不易出现纳米桥接或图案坍塌。