Process for the manufacture of hmg-coa reductase inhibitory mevalonic acid derivatives
申请人:Sedelmeier Gottfried
公开号:US20050159480A1
公开(公告)日:2005-07-21
The invention relates to a process for the manufacture of a compound of formula: (Formula I); or a salt, especially a pharmaceutically acceptable salt with a base, thereof or a lactone thereof wherein the element (a) represents —CH
2
—CH
2
— or —CH═CH— and R represents a cyclic radical.
本发明涉及一种制备式为(Formula I)的化合物或其盐,尤其是与碱形成的药学上可接受的盐,或其内酯的方法,其中元素(a)表示—CH2—CH2—或—CH═CH—,R代表一个环状基团。