1'H-1,2'-联咪唑 | 110700-40-8

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑类
• 中文名称: 1'H-1,2'-联咪唑
• 英文名称: 1'H-1,2'-biimidazole
• 英文别名: 1-(1H-imidazol-2-yl)imidazole
• CAS: 110700-40-8
• 化学式: C₆H₆N₄
• 分子量: 134.14
• InChiKey: QJJIVVYRIRPZTQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.1
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• [EN] IMIDAZOLYL-IMIDAZOLES AS KINASE INHIBITORS<br/>[FR] IMIDAZOLYL-IMIDAZOLES EN TANT QU'INHIBITEURS DE KINASE
  申请人：GLAXO GROUP LTD

  公开号：WO2011123609A1

  公开（公告）日：2011-10-06

  Disclosed are compounds having the formula: wherein R1A, R1B, R2 and R3 are as defined herein, and methods of making and using the same.

  揭示了具有以下公式的化合物：其中R1A、R1B、R2和R3如本文所定义，并且制备和使用这些化合物的方法。
• Biimidazole diamide anion binding agents
  申请人：Allen E. William

  公开号：US20050004370A1

  公开（公告）日：2005-01-06

  Biimidazole diamide compounds that are useful for binding anions such as sulfate are described, along with the use thereof for purposes such as extracting anions from a waste stream and/or detecting anions.

  本文描述了用于结合阴离子，如硫酸的双咪唑二酰胺化合物，以及其用途，例如从废水流中提取阴离子和/或检测阴离子。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20040142280A1

  公开（公告）日：2004-07-22

  A radiation-sensitive resin composition comprising (A) an alkali-soluble resin having an unsaturated group, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a radiation-induced radical polymerization initiator, wherein: the alkali-soluble resin having an unsaturated group (A) is obtained by reacting: 100 parts by weight of a copolymer comprising 1 to 40 wt % structural units derived from (a) a radically polymerizable compound having a carboxyl group; 1 to 50 wt % structural units having a phenolic hydroxyl group which are derived from (b-1) a radically polymerizable compound having a phenolic hydroxyl group or (b-2) a radically polymerizable compound having a functional group convertible into a phenolic hydroxyl group after the copolymerization, other structural units of said copolymer being derived from (c) another radically polymerizable compound; with 0.1 to 20 parts by weight of (d) a radically polymerizable compound having an epoxy group. The resin composition can form a radiation-sensitive film in a thickness greater than a deposit thickness and has a high resolution.

  一种辐射敏感的树脂组合物，包括（A）具有不饱和基团的碱溶性树脂，（B）至少具有一个乙烯基不饱和双键的化合物，和（C）辐射诱导的自由基聚合引发剂，其中：具有不饱和基团的碱溶性树脂（A）是通过反应得到的：100重量份的共聚物，包括1至40重量％的由（a）具有羧基的自由基聚合化合物衍生的结构单元，1至50重量％的具有酚羟基的结构单元，该结构单元来源于（b-1）具有酚羟基的自由基聚合化合物或（b-2）在共聚之后可以转化为酚羟基的功能性基团的自由基聚合化合物，该共聚物的其他结构单元来源于（c）另一种自由基聚合化合物；以及0.1至20重量份的具有环氧基团的自由基聚合化合物（d）。该树脂组合物可以形成具有高分辨率的辐射敏感薄膜，其厚度大于沉积厚度。
• IMIDAZOLYL-IMIDAZOLES AS KINASE INHIBITORS
  申请人：Bodmer Vera Q.

  公开号：US20130018039A1

  公开（公告）日：2013-01-17

  Disclosed are compounds having the formula: wherein R 1A , R 1B , R 2 and R 3 are defined herein, and methods of making and using the same.

  本发明涉及具有以下式的化合物：其中R1A，R1B，R2和R3如本文所定义，并且涉及其制备和使用的方法。
• Thiazolylpiperidine Derivatives as Fungicides
  申请人：CRISTAU Pierre

  公开号：US20130090476A1

  公开（公告）日：2013-04-11

  Thiazolylpiperidine derivatives of the formula (I), in which the symbols A, G, Y, n, R 1 , R 2 , R 3 , R 4 and R 5 have the meanings given in the description, and also agrochemically active salts thereof, and their use for controlling phytopathogenic harmful fungi, and also processes for preparing compounds of the formula (I).

  公式（I）中的噻唑啉衍生物，其中符号A，G，Y，n，R1，R2，R3，R4和R5具有描述中给出的含义，以及其农药活性盐，其用于控制植物病原真菌的有害作用，以及制备公式（I）化合物的过程。