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1-异丁氧基-2-苯氧基乙烷 | 100520-21-6

中文名称
1-异丁氧基-2-苯氧基乙烷
中文别名
——
英文名称
1-isobutoxy-2-phenoxy-ethane
英文别名
1-Isobutoxy-2-phenoxy-aethan;2-Phenoxyethanol, 2-methylpropyl ether;2-(2-methylpropoxy)ethoxybenzene
1-异丁氧基-2-苯氧基乙烷化学式
CAS
100520-21-6
化学式
C12H18O2
mdl
——
分子量
194.274
InChiKey
UNUPRSSOTAKMGM-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.1
  • 重原子数:
    14
  • 可旋转键数:
    6
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.5
  • 拓扑面积:
    18.5
  • 氢给体数:
    0
  • 氢受体数:
    2

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量
  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • Catalytic Olefin Hydroalkoxylation by Nano Particles of Pollucite
    作者:Sara Zamanian、Ali Nemati Kharat
    DOI:10.1071/ch14492
    日期:——

    The catalytic hydroalkoxylation of α,β-unsaturated esters, nitriles, and ethers with aliphatic and aromatic alcohols over pollucite using thermal and microwave-assisted methods was investigated. To study the effect of the alcohol structures on the mechanism of the hydroalkoxylation reaction, different alcohols, such as methanol to butanol, cyclohexanol, phenol, and 2-ethylhexanol were used. The activities of pollucite, in contrast to other basic solids, were scarcely affected by the presence of air and moisture. The correlation between alcohol acidity and reaction activity is discussed. The prepared pollucite was characterized by X‐ray diffraction, volumetric nitrogen adsorption surface area analysis, and CO2 temperature‐programmed desorption. Scanning electron microscopy analysis revealed that the size of the modified nano catalyst particles was under 40 nm.

    本研究采用热和微波辅助方法,研究了α,β-不饱和酯类、腈类和醚类与脂肪族和芳香族醇在沸石上的催化加氢烷氧基化反应。为了研究醇结构对羟基烷氧基化反应机理的影响,使用了不同的醇,如甲醇、丁醇、环己醇、苯酚和 2-乙基己醇。与其他碱性固体相比,波来石的活性几乎不受空气和水分的影响。本文讨论了醇酸度与反应活性之间的相关性。通过 X 射线衍射、体积氮吸附表面积分析和 CO2 温度编程解吸法对制备的波来石进行了表征。扫描电子显微镜分析表明,改性纳米催化剂颗粒的尺寸小于 40 纳米。
  • COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD
    申请人:MITSUBISHI GAS CHEMICAL COMPANY, INC.
    公开号:US20200249573A1
    公开(公告)日:2020-08-06
    The present invention provides a composition for resist underlayer film formation comprising a tellurium-containing compound or a tellurium-containing resin.
    本发明提供了一种用于抗蚀底层膜形成的组合物,其包括含碲化合物或含碲树脂。
  • COMPOUND, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
    申请人:Echigo Masatoshi
    公开号:US20130122423A1
    公开(公告)日:2013-05-16
    The object is to provide a compound having high dissolvability in a safe solvent and high sensitivity, and also capable of obtaining a good resist pattern shape, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition. For this purpose, a compound (B) obtained by reaction between a polyphenol based cyclic compound (A) and a compound (C) having a particular structure, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition are provided.
    本发明的目的是提供一种在安全溶剂中具有高溶解度和高灵敏度的化合物,同时还能获得良好的抗蚀图案形状,包含该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。为此,提供了通过多酚基环状化合物(A)和具有特定结构的化合物(C)反应得到的化合物(B),包含该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。
  • Liquid crystal orienting agent
    申请人:JAPAN SYNTHETIC RUBBER CO., LTD.
    公开号:EP0735403A1
    公开(公告)日:1996-10-02
    A liquid crystal aligning agent contains (1) at least one polymer selected from the group consisting of a polyamic acid obtainable by a reaction between a tetracarboxylic acid dianhydride and a diamine compound and an imidized polymer obtainable by cyclization with dehydration of the polyamic acid; (2) at least one first solvent selected from the group consisting of N-alkyl-2-pyrrolidones, lactones, and 1,3-dialkyl-2-imidazolidinones; (3) at least one second solvent selected from the group consisting of: (a) a first compound represented by general formula (I) wherein R1 is an alkylene group having 2 or 3 carbon atoms; R2 is an alkyl group having 1 to 4 carbon atoms an acetyl group or a propionyl group; R3 is an alkyl group having 1 to 3 carbon atoms, an alkoxyl group having 1 to 3 carbon atoms, or a halogen atom; a is 1 or 2; and b is 0 or integers of from 1 to 5; and (b) a second compound represented by general formula (II) wherein R4 is an alkyl group having 1 to 4 carbon atoms; R5 is an alkylene group having 2 or 3 carbon atoms; R6 is an alkyl group having 1 to 3 carbon atoms; and c is 1 or 2.
    液晶对准剂包含 (1) 至少一种聚合物,选自由四羧酸二酐和二胺化合物反应生成的聚氨基 酸和聚氨基酸脱水环化生成的亚胺化聚合物组成的组; (2) 至少一种第一溶剂,选自由 N-烷基-2-吡咯烷酮、内酯和 1,3-二烷基-2-咪唑烷酮组成的组; (3) 至少一种第二溶剂,选自由下列物质组成的组 (a) 通式 (I) 所代表的第一种化合物 其中 R1 是具有 2 或 3 个碳原子的亚烷基;R2 是具有 1 至 4 个碳原子的烷基、乙酰基或丙酰基;R3 是具有 1 至 3 个碳原子的烷基、具有 1 至 3 个碳原子的烷氧基或卤原子;a 是 1 或 2;b 是 0 或 1 至 5 的整数;以及 (b) 通式(II)代表的第二种化合物 其中 R4 是具有 1 至 4 个碳原子的烷基;R5 是具有 2 或 3 个碳原子的亚烷基;R6 是具有 1 至 3 个碳原子的烷基;以及 c 是 1 或 2。
  • Resist composition, method for forming resist pattern, polyphenol derivative for use in the composition
    申请人:Mitsubishi Gas Chemical Company, Inc.
    公开号:US10377734B2
    公开(公告)日:2019-08-13
    The present invention provides a resist composition which is excellent in heat resistance, has high solubility in a safe solvent, has high sensitivity, and can impart a good shape to a resist pattern. Such a resist composition contains a compound represented by the following general formula (1) or (2):
    本发明提供了一种抗蚀剂组合物,它具有优异的耐热性,在安全溶剂中的溶解度高,灵敏度高,并能赋予抗蚀图案良好的形状。这种抗蚀剂组合物含有由以下通式(1)或(2)代表的化合物:
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