1-甲基六氢邻苯二甲酸酐 | 48122-14-1

• 物质功能分类: 化学试剂 - 有机试剂 - 羧酸酐
• 分子结构分类: 有机化合物 - 有机杂环化合物 - 异苯并呋喃
• 中文名称: 1-甲基六氢邻苯二甲酸酐
• 中文别名: 甲基六氢化邻苯二甲酸酐；甲基六氢苯酐；甲基六氢邻苯二甲酸酐
• 英文名称: methylhexahydrophthalic anhydride
• 英文别名: methyl-tetrahydrophthalic anhydride；7a-methyl-4,5,6,7-tetrahydro-3aH-2-benzofuran-1,3-dione
• CAS: 48122-14-1；25550-51-0
• 化学式: C₉H₁₂O₃
• 分子量: 168.192
• InChiKey: VYKXQOYUCMREIS-UHFFFAOYSA-N

物化性质

• 沸点：
  299℃[at 101 325 Pa]
• 密度：
  1.162
• 溶解度：
  可溶于氯仿（少许）、甲醇（少许）
• LogP：
  2.59 at 25℃
• 物理描述：
  COLOURLESS LIQUID.
• 熔点：
  -29 °C
• 闪点：
  145 °C
• 蒸汽压力：
  Vapor pressure, Pa at 20 °C: 1

计算性质

• 辛醇/水分配系数(LogP)：
  1.5
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  43.4
• 氢给体数：
  0
• 氢受体数：
  3

ADMET

毒理性

• 暴露途径

该物质可以通过吸入和摄入被身体吸收。

The substance can be absorbed into the body by inhalation and by ingestion.

来源:ILO-WHO International Chemical Safety Cards (ICSCs)

毒理性

• 吸入症状

咳嗽。喘息。

Cough. Wheezing.

来源:ILO-WHO International Chemical Safety Cards (ICSCs)

毒理性

• 皮肤症状

红色。

Redness.

来源:ILO-WHO International Chemical Safety Cards (ICSCs)

毒理性

• 眼睛症状

红斑。疼痛。

Redness. Pain.

来源:ILO-WHO International Chemical Safety Cards (ICSCs)

毒理性

• 摄入症状

腹痛。腹泻。

Abdominal pain. Diarrhoea.

来源:ILO-WHO International Chemical Safety Cards (ICSCs)

制备方法与用途

化学性质：无色透明液体。

用途广泛，是一种优良的有机溶剂。主要用作油和脂肪的溶剂、提取剂、锂电池的电解溶剂、氯基溶剂稳定剂、药物中间体以及共聚甲醛的原料。此外，还可用于丝绸整理剂及封口胶原料。

用途还包括作为环氧树脂固化剂。

反应信息

• 作为反应物：
  描述：

  1-甲基六氢邻苯二甲酸酐 生成 5-methylhexahydroisoindole-1,3-dione
  参考文献：
  名称：

  ANTOKU, FUDZIO;JOSIGI, MAYUMI;SADZI, IKUTARO

  摘要：

  DOI：
• 作为产物：
  描述：

  methyltetrahydrophthalic anhydride 在 氢气 作用下， 80.0~130.0 ℃ 、5.0 MPa 条件下， 反应 2.0h， 以97.6%的产率得到1-甲基六氢邻苯二甲酸酐
  参考文献：
  名称：

  CN106831677

  摘要：

  公开号：

文献信息

• [EN] OXIME ESTER PHOTOINITIATORS<br/>[FR] PHOTO-INITIATEURS À BASE D'ESTER D'OXIME
  申请人：BASF SE

  公开号：WO2021175855A1

  公开（公告）日：2021-09-10

  Disclosed are α-oxo oxime ester compounds based on carbazole derivatives which have specific substituent groups useful as a photoinitiator, as well as photopolymerizable compositions comprising said photoinitiator and ethylenically unsaturated compounds. The photopolymerizable compositions are useful, for example, in photoresist formulations for display applications, e.g. liquid crystal display (LCD), organic light emitting diode (OLED) and touch panel.

  揭示了基于咔唑衍生物的α-氧代肟酯化合物，其具有特定取代基，可用作光引发剂，以及包括所述光引发剂和乙烯不饱和化合物的光聚合组合物。这些光聚合组合物可用于例如显示应用的光阻配方，例如液晶显示器（LCD）、有机发光二极管（OLED）和触摸面板。
• OXIME ESTER PHOTOINITIATORS
  申请人：BASF SE

  公开号：US20180208583A1

  公开（公告）日：2018-07-26

  Compounds of the formulae (I) or (II) wherein X is A is O, S, NR 5 or CR 16 R 17 ; R 1 is for example hydrogen or C 1 -C 20 alkyl R 2 is for example hydrogen, C 1 -C 20 alkyl or C 6 -C 20 aryl R 5 for example is C 1 -C 20 alkyl; R 7 , R 8 , R 9 , R 10 and R 11 for example independently of each other are hydrogen. C 1 -C 20 alkyl, halogen, CN or NO 2 ; Ar 1 is for example unsubstituted or substituted C 6 -C 20 aryl, C 3 -C 20 heteroaryl, C 6 -C 20 aroyl, C 3 -C 20 heteroarylcarbonyl or or Ar 1 is Ar 2 is for example phenylene, all of which are unsubstituted or substituted M is for example unsubstituted or substituted C 1 -C 20 alkylene Y is a direct bond, O, S, NR 5 or CO; Z 1 is for example O or S; Z 2 is a direct bond, O, S or NR 5 ; and Q is CO or a direct bond.

  公式(I)或(II)的化合物 其中 X是 A是O, S, NR 5 或CR 16 R 17 ; R 1 例如是氢或C 1 -C 20 烷基 R 2 例如是氢, C 1 -C 20 烷基或C 6 -C 20 芳基 R 5 例如是C 1 -C 20 烷基; R 7 , R 8 , R 9 , R 10 和R 11 例如彼此独立是氢. C 1 -C 20 烷基, 卤素, CN或NO 2 ; Ar 1 例如是不取代或取代的C 6 -C 20 芳基, C 3 -C 20 杂芳基, C 6 -C 20 芳酰基, C 3 -C 20 杂芳基甲酰基或 或Ar 1 是 Ar 2 例如是苯基, 所有这些都不取代或取代 M例如是不取代或取代的C 1 -C 20 亚烷基 Y是直接键, O, S, NR 5 或CO; Z 1 例如是O或S; Z 2 是直接键, O, S或NR 5 ; 和 Q是CO或直接键。
• ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND BETA-DIKETONE COMPOUND
  申请人：Yamada Takashi

  公开号：US20100129753A1

  公开（公告）日：2010-05-27

  An alkali developable photosensitive resin composition contains (J) a photopolymerizable unsaturated compound having a structure resulting from the addition reaction of (B) a compound having a β-diketone moiety or a compound having a β-ketoester group to the (meth)acryloyl group of (A) a compound having at least two (meth)acryloyl groups and a hydroxyl group and subsequent esterification of the hydroxyl group of the resulting addition product with (C) a polybasic acid anhydride. The compound having a β-diketone moiety is preferably a novel β-diketone compound represented by general formula (I): wherein R 1 is a C1-C20 alkyl group; R 2 represents R 11 , OR 11 , COR 11 , SR 11 , CONR 12 R 13 , or CN; R 11 , R 12 , and R 13 are each hydrogen, a C1-C20 alkyl group, etc.; a is 0 to 3; and b is 0 to 4.

  一种可由碱显影的光敏树脂组合物，含有（J）一种光聚合不饱和化合物，该化合物的结构是由（B）含β-二酮基团或含β-酮酯基团的化合物与（A）含至少两个(甲基)丙烯酰基团和一个羟基的化合物中的(甲基)丙烯酰基团发生加成反应，并随后将所得加成产物的羟基与（C）多元酸酐进行酯化反应得到的。含β-二酮基团的化合物最好是表示为通用公式（I）的一种新型β-二酮化合物：其中R1是C1-C20烷基团；R2代表R11、OR11、COR11、SR11、CONR12R13或CN；R11、R12和R13分别是氢、C1-C20烷基团等；a是0到3；b是0到4。
• SUBSTITUTED OR UNSUBSTITUTED ALLYL GROUP-CONTAINING MALEIMIDE COMPOUND, PRODUCTION METHOD THEREFOR, AND COMPOSITION AND CURED PRODUCT USING SAID COMPOUND
  申请人：DIC CORPORATION

  公开号：US20200325101A1

  公开（公告）日：2020-10-15

  Bismaleimides (BMI) exhibit excellent heat resistance (high Tg and high resistance to thermal decomposition) compared to epoxy resins and phenolic resins, and therefore, in recent years, more attention is paid to bismaleimides as a resin material for the next-generation devices represented by SiC power semiconductors, in addition to the investigation on the use of bismaleimides for electronic material applications. As such, conventional BMI's are known as highly heat-resistant resins; however, there is a demand for a resin having higher heat resistance for advanced material applications and the like. Thus, an object of the invention is to provide a novel maleimide compound having superior heat resistance. Disclosed is a substituted or unsubstituted allyl group-containing maleimide compound having a structure with three or more benzene rings, having one or more groups each having a substituted or unsubstituted allyl group, and having one or more maleimide groups.

  亚苯基马来酰亚胺化合物，具有三个或更多苯环的结构，含有一个或多个取代或未取代的烯丙基团，以及一个或多个马来酰亚胺基团，具有卓越的耐热性。
• NOVOLAC RESIN AND RESIST FILM
  申请人：DIC Corporation

  公开号：US20180334523A1

  公开（公告）日：2018-11-22

  Provided are a novolac resin having developability, heat resistance, and dry etching resistance, and a photosensitive composition, a curable composition, and a resist film. A novolac resin including, as a repeating unit, a structural moiety represented by Structural Formula (1) or (2): (in the formula, Ar represents an arylene group, R 1 's each independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, m's each independently represent an integer of 1 to 3, and X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group) in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

  提供一种具有可开发性、耐热性和干法蚀刻抗性的新戊醛树脂，以及一种光敏组合物、可固化组合物和抗蚀膜。一种新戊醛树脂包括以下结构单元： （在公式中，Ar代表芳基，R 1 分别独立地代表氢原子、烷基、烷氧基和卤素原子中的任意一种，m分别独立地代表1至3的整数，X代表氢原子、三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种），树脂中至少有一个X是三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种。