申请人:Sumitomo Chemical Company, Limited
公开号:US05866724A1
公开(公告)日:1999-02-02
A positive photoresist compositions comprising, as a photosensitizer, a quinonediazide sulfonic acid ester of a phenol compound represented by the following formula (I): ##STR1## wherein Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, Q.sup.5, Q.sup.6, Q.sup.7, Q.sup.8, Q.sup.9 and Q.sup.10 independently represent hydrogen, alkyl having 1-6 carbon atoms or phenyl, or Q.sup.1 and Q.sup.2, Q.sup.3 and Q.sup.4, Q.sup.5 and Q.sup.6, Q.sup.7 and Q.sup.8, or Q.sup.9 and Q.sup.10 may form a cycloalkane ring having 6 or less carbon atoms together with a carbon atoms to which they are connected, R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, R.sup.10, R.sup.11, R.sup.12, R.sup.13, R.sup.14, R.sup.15 and R.sup.16 independently represent hydrogen, hydroxyl, alkyl having 1-6 carbon atoms or phenyl; and m and n independently represent a number of 0 or 1; and an alkali soluble resin; and a quinonediazide sulfonic acid ester of a phenol compound of formula (I).
一种正相光刻胶组合物,包括以下式(I)所代表的酚化合物的喹喔二唑磺酸酯作为光敏剂:其中Q.sup.1、Q.sup.2、Q.sup.3、Q.sup.4、Q.sup.5、Q.sup.6、Q.sup.7、Q.sup.8、Q.sup.9和Q.sup.10独立地代表氢、具有1-6个碳原子的烷基或苯基,或Q.sup.1和Q.sup.2、Q.sup.3和Q.sup.4、Q.sup.5和Q.sup.6、Q.sup.7和Q.sup.8、或Q.sup.9和Q.sup.10可以与它们连接的碳原子一起形成具有6个或更少碳原子的环烷烃环,R.sup.1、R.sup.2、R.sup.3、R.sup.4、R.sup.5、R.sup.6、R.sup.7、R.sup.8、R.sup.9、R.sup.10、R.sup.11、R.sup.12、R.sup.13、R.sup.14、R.sup.15和R.sup.16独立地代表氢、羟基、具有1-6个碳原子的烷基或苯基;m和n独立地代表0或1的数字;以及一种碱溶性树脂;和式(I)的一种酚化合物的喹喔二唑磺酸酯。