2,6-双[(4-羟基-3,5-二甲基苯基)甲基]-4-甲基苯酚 | 66232-87-9

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 中文名称: 2,6-双[(4-羟基-3,5-二甲基苯基)甲基]-4-甲基苯酚
• 英文名称: GRI 406402
• 英文别名: 2,6-Bis-(4-hydroxy-3,5-dimethyl-benzyl)-4-methyl-phenol；4-Hydroxy-1-methyl-3,5-bis-(4-hydroxy-3,5-dimethyl-benzyl)-benzol；4,4'-[(2-Hydroxy-5-methyl-1,3-phenylene)bis(methylene)]bis(2,6-dimethylphenol)；2,6-bis[(4-hydroxy-3,5-dimethylphenyl)methyl]-4-methylphenol
• CAS: 66232-87-9
• 化学式: C₂₅H₂₈O₃
• 分子量: 376.496
• InChiKey: CPIALDYHMPPRDJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.5
• 重原子数：
  28
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.28
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  2,6-双[(4-羟基-3,5-二甲基苯基)甲基]-4-甲基苯酚 、 乙酸酐 在 sodium acetate 作用下， 生成 2-acetoxy-1,3-bis-(4-acetoxy-3,5-dimethyl-benzyl)-5-methyl-benzene
  参考文献：
  名称：

  The effects of grades on course enjoyment: Did you get the grade you wanted?

  摘要：

  Background. Students tend to rate university courses more positively if they do well. Greenwald and Gillmore (1997a) suggested that it is not students’ absolute grades that are important but rather how these grades compare to their expectations. However, this hypothesis is difficult to evaluate because few studies have measured grade expectations at the beginning of courses. Aim. By measuring students’ grade expectations and enjoyment at several stages during a course, we hoped to evaluate the extent to which expectations modulate the impact of grades on course enjoyment. Sample. Participants were 242 students in a university course in psychology. Method. Students were asked what grades they expected, and how much they were enjoying the course, at four stages. The effect of grades and grade expectations on enjoyment were analysed using restricted maximum likelihood (REML) and regression analyses. Results. The best predictor of course enjoyment varied somewhat at different stages, but in general it was the extent to which students’ grades surpassed their expectations. Students’ expectations at the beginning of the course proved particularly influential. Conclusions. Grade expectations do influence how students react to course grades, but the prominent role of pre‐course expectations suggests that it may be important to distinguish between grade aspirations and grade expectations. It appears to be students’ aspirations ‐ the grades they hope to achieve ‐ that most strongly shape their emotional reactions, rather than the more realistic expectations they may form later in a course.

  DOI：

  10.1348/000709900158173
• 作为产物：
  描述：

  2-羟基-5-甲基间苯二甲醇 、 2,6-二甲基苯酚 在 盐酸 作用下， 生成 2,6-双[(4-羟基-3,5-二甲基苯基)甲基]-4-甲基苯酚
  参考文献：
  名称：

  Hydrogen Bonding in Phenolic Resin Intermediates

  摘要：

  DOI：

  10.1021/ja01633a091

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
  申请人：Enomoto Yuichiro

  公开号：US20120282548A1

  公开（公告）日：2012-11-08

  Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

  提供的是一种形成图案的方法，包括(i)使用光致或辐射敏感树脂组成物形成薄膜的步骤，(ii)曝光薄膜的步骤，以及(iii)使用有机溶剂含有的显影剂显影曝光后的薄膜的步骤，其中光致或辐射敏感树脂组成物包括(A)一种能够通过酸的作用降低有机溶剂含有的显影剂的溶解度的树脂，(B)一种能够在光致或辐射照射下生成酸的化合物，(D)一种溶剂，以及(G)一种具有氟原子和硅原子中的至少一种，并具有碱性或能够通过酸的作用增加碱性的化合物。
• CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
  申请人：Takasuka Masaaki

  公开号：US20120282546A1

  公开（公告）日：2012-11-08

  Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition.

  本发明涉及一种具有高溶解度、高灵敏度、能够形成良好形状的抗蚀图案，且很少引起抗蚀图案崩塌的环状化合物；一种制备该环状化合物的方法；一种含有该环状化合物的辐射敏感组合物；以及使用该组合物的抗蚀图案形成方法。具体揭示了一种具有特定结构的环状化合物，制备该环状化合物的方法，含有该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。
• Positive type photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0445680A2

  公开（公告）日：1991-09-11

  A positive type photoresist composition which is superior in the prevention of pattern break and scumming during development, comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein said novolak resin is a condensate of a mixture of m-cresol and p-cresol with at least one of formaldehyde, formaldehyde polymer and formaldehyde precursor and wherein the relationship between X = A/(A+B+C) and the content of m-cresol in said novolak resin falls within the shaded part (including the straight lines surrounding this part) in Figure 1, said A representing an integrated value of peak area between 23.0 ppm and 31.0 ppm , B representing an integrated value of peak area between 31.0 ppm and 34.0 ppm and C representing an integrated value of peak area between 34.0 ppm and 37.0 ppm in a ¹³C-NMR spectrum of a dimethyl sulfoxide-d₆ solution of said novolak resin.

  一种正型光刻胶组合物，在显影过程中可有效防止图案破裂和浮渣，该组合物由碱溶性酚醛树脂和 1,2-醌噻嗪化合物组成，其中所述酚醛树脂是间甲酚和对甲酚与甲醛、甲醛聚合物和甲醛前体中至少一种的混合物的缩合物、其中，X = A/(A+B+C) 与间甲酚在所述酚醛树脂中的含量之间的关系在图 1 中的阴影部分（包括围绕该部分的直线）内，所述 A 代表峰面积的综合值，介于 23.在所述酚醛树脂的二甲亚砜-d₆溶液的¹³C-NMR 光谱中，A 代表峰面积的综合值在 23.0 ppm 和 31.0 ppm 之间，B 代表峰面积的综合值在 31.0 ppm 和 34.0 ppm 之间，C 代表峰面积的综合值在 34.0 ppm 和 37.0 ppm 之间。
• POLYELECTROLYTE FILM
  申请人：Kuraray Co., Ltd.

  公开号：EP2889940A1

  公开（公告）日：2015-07-01

  Provided is a polymer electrolyte membrane that is formed of a fluorine free material, is soft and hardly cracks, and is excellent in hot water resistance. The polymer electrolyte membrane is obtained by crosslinking a block copolymer (Z) containing a polymer block (A) containing a structural unit derived from an aromatic vinyl compound and having an ion-conducting group; and an amorphous polymer block (B) containing a structural unit derived from an unsaturated aliphatic hydrocarbon and free of any ion-conducting group, the block copolymer (Z) being crosslinked with a crosslinking agent (X) having, in a molecule thereof, two or more aromatic rings of which one or more hydrogen atoms are substituted with hydroxy groups.

  本发明提供了一种聚合物电解质膜，该膜由无氟材料制成，质地柔软，不易开裂，并且具有优异的耐热水性。该聚合物电解质膜是通过交联嵌段共聚物（Z）而获得的，嵌段共聚物（Z）包含一个聚合物嵌段（A），该聚合物嵌段（A）的结构单元来自芳香族乙烯基化合物，并具有一个离子导电基团；以及一个无定形聚合物嵌段（B），该无定形聚合物嵌段（B）的结构单元来自不饱和脂肪烃，且不含任何离子导电基团，嵌段共聚物（Z）与交联剂（X）交联，交联剂（X）的分子中具有两个或多个芳香环，其中一个或多个氢原子被羟基取代。