2,6-bis[(3-formyl-4-hydroxyphenyl)methyl]-4-methylphenol | 884498-10-6

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 2,6-bis[(3-formyl-4-hydroxyphenyl)methyl]-4-methylphenol
• 英文别名: 5-({3-[(3-formyl-4-hydroxyphenyl)methyl]-2-hydroxy-5-methylphenyl}methyl)-2-hydroxybenzaldehyde；5-[[3-[(3-formyl-4-hydroxyphenyl)methyl]-2-hydroxy-5-methylphenyl]methyl]-2-hydroxybenzaldehyde
• CAS: 884498-10-6
• 化学式: C₂₃H₂₀O₅
• 分子量: 376.409
• InChiKey: AWWYJSIJEGUIPL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  28
• 可旋转键数：
  6
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.13
• 拓扑面积：
  94.8
• 氢给体数：
  3
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  2,6-bis[(3-formyl-4-hydroxyphenyl)methyl]-4-methylphenol 、 氯乙酸甲酯 在 potassium iodide potassium carbonate 作用下， 以 N-甲基吡咯烷酮 为溶剂， 反应 6.0h， 生成 2,6-bis {(3-formyl-4-methoxycarbonylmethoxyphenyl)methyl}-4-methyl-1-methoxycarbonylmethoxybenzene
  参考文献：
  名称：

  NOVEL BIS(FORMYLPHENYL) COMPOUND AND NOVEL POLYNUCLEAR POLYPHENOL COMPOUND DERIVED FROM THE SAME

  摘要：

  通用公式（1）表示的双(甲酰基苯基)化合物可以通过使用相应的双(羟基甲酰基苯基)化合物作为直接原料，并在碱的存在下使其与卤代烷氧羰基碳氢化合物发生反应，按照已知的苯醚制备方法制造。

  公开号：

  US20110028752A1
• 作为产物：
  描述：

  2-羟基-5-甲基间苯二甲醇 、 水杨醛 在 磷酸 作用下， 以 水 为溶剂， 反应 23.5h， 以47.7%的产率得到2,6-bis[(3-formyl-4-hydroxyphenyl)methyl]-4-methylphenol
  参考文献：
  名称：

  WO2006/90757

  摘要：

  公开号：

文献信息

• Positive Resist Composition, Method For Resist Pattern Formation and Compound
  申请人：Shiono Daiju

  公开号：US20080145784A1

  公开（公告）日：2008-06-19

  A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A1), in which either a portion of, or all of, hydrogen atoms of phenolic hydroxyl groups within a polyhydric phenol compound, which has two or more phenolic hydroxyl groups, a molecular weight of 300 to 2,500, and is represented by a general formula (I) shown below, have been substituted with an acid-dissociable, dissolution-inhibiting group (II) represented by a general formula (II) shown below.

  一种正性光阻组合物，包括含有酸解离、抑制溶解基团并在酸作用下表现出增加碱溶性的基材料组分（A）和生成酸的酸发生器组分（B），其中基材料组分（A）包含化合物（A1），它是一种多酚酚类化合物，具有两个或两个以上的酚羟基，分子量为300至2500，并且在化合物中酚羟基的部分或全部氢原子被代替为酸解离、抑制溶解基团（II），该基团由下式（II）表示。
• Positive resist composition, method for resist pattern formation and compound
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US07504196B2

  公开（公告）日：2009-03-17

  A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A1), in which either a portion of, or all of, hydrogen atoms of phenolic hydroxyl groups within a polyhydric phenol compound, which has two or more phenolic hydroxyl groups, a molecular weight of 300 to 2,500, and is represented by a general formula (I) shown below, have been substituted with an acid-dissociable, dissolution-inhibiting group (II) represented by a general formula (II) shown below.

  一种正性光刻胶组合物，包括基材料组分(A)，其含有一个酸解离、抑制溶解基团，并在酸的作用下表现出增加的碱溶性，以及酸发生剂组分(B)，其在曝光后生成酸，其中基材料组分(A)含有化合物(A1)，该化合物中的苯酚羟基的氢原子的一部分或全部已被替换成一个酸解离、抑制溶解基团(II)，该化合物是一种多羟基酚化合物，具有两个或更多苯酚羟基，分子量为300到2500，由下式(I)表示，所述酸解离、抑制溶解基团(II)由下式(II)表示。
• NOVEL BIS-(HYDROXYBENZALDEHYDE) COMPOUND AND NOVEL POLYNUCLEAR POLYPHENOL COMPOUND DERIVED THEREFROM AND METHOD FOR PRODUCTION THEREOF
  申请人：Yoshitomo Akira

  公开号：US20090076310A1

  公开（公告）日：2009-03-19

  Provide a new bis-(hydroxybenzaldehyde) compound, as well as a new polynuclear polyphenol compound derived therefrom, suitable for use as component materials for photosensitive resist compositions, component materials and hardeners for epoxy resins, developers and anti-fading agents used in thermosensitive recording materials, bactericides, fungicides, antioxidants and other functional chemical products or component materials thereof, wherein such bis-(hydroxybenzaldehyde) compound is produced by reacting in the presence of trihalogenated acetic acid catalyst or phosphoric acid catalyst a 2,6-di(hydroxymethyl)-4-alkylphenol with a hydroxybenzaldehyde expressed by general formula (14).
• RESIST COMPOSITION, RESIST PATTERN FORMING METHOD AND COMPOUND
  申请人：Shiono Daiju

  公开号：US20090162781A1

  公开（公告）日：2009-06-25

  This resist composition is a resist composition containing a compound in which a portion or all of hydrogen atoms of phenolic hydroxyl groups in a polyhydric phenol compound (a) having two or more phenolic hydroxyl groups and having a molecular weight of 300 to 2,500 are substituted with at least one selected from the group consisting of acid dissociable dissolution inhibiting groups represented by the following general formulas (p1) and (p2) wherein R 1 and R 2 each independently represents a branched or cyclic alkyl group, and may contain a hetero atom in the structure; R 3 represents a hydrogen atom or a lower alkyl group; and n′ represents an integer of 1 to 3.
• US7586009B2
  申请人：——

  公开号：US7586009B2

  公开（公告）日：2009-09-08