N,N'-bis(2-hydroxy-5-methylbenzyl)ethylenediamine-N,N'-diacetic acid | 30114-61-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: N,N'-bis(2-hydroxy-5-methylbenzyl)ethylenediamine-N,N'-diacetic acid
• 英文别名: N,N'-Bis-carboxymethyl-N,N'-bis-(2-hydroxy-5-methyl-benzyl)-aethylendiamin；2-[2-[carboxymethyl-[(2-hydroxy-5-methylphenyl)methyl]amino]ethyl-[(2-hydroxy-5-methylphenyl)methyl]amino]acetic acid
• CAS: 30114-61-5
• 化学式: C₂₂H₂₈N₂O₆
• 分子量: 416.474
• InChiKey: RLLUWCNMLSMLET-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -2.1
• 重原子数：
  30
• 可旋转键数：
  11
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  122
• 氢给体数：
  4
• 氢受体数：
  8

反应信息

• 作为反应物：
  描述：

  N,N'-bis(2-hydroxy-5-methylbenzyl)ethylenediamine-N,N'-diacetic acid 在 盐酸 作用下， 以 水 为溶剂， 生成 N,N'-bis(2-hydroxy-5-methylbenzyl)ethylenediamine-N,N'-diacetic acid monohydrochloride
  参考文献：
  名称：

  A process for the preparation of N,N'-bis(2-hydroxybenzyl)ethylenediamine-N,N'-diacetic acid and its derivatives

  摘要：

  公开号：

  EP2039679B1
• 作为产物：
  描述：

  乙醛酸 、 N,N'-bis(2-hydroxy-5-methylbenzyl)ethylenediamine 在 palladium on activated charcoal 氢气 、 三乙胺 作用下， 以 甲醇 为溶剂， 50.0 ℃ 、506.66 kPa 条件下， 反应 36.0h， 以83%的产率得到N,N'-bis(2-hydroxy-5-methylbenzyl)ethylenediamine-N,N'-diacetic acid
  参考文献：
  名称：

  A process for the preparation of N,N'-bis(2-hydroxybenzyl)ethylenediamine-N,N'-diacetic acid and its derivatives

  摘要：

  公开号：

  EP2039679B1

文献信息

• [EN] A PROCESS FOR THE PREPARATION OF FE(III) CHELATES OF N,N'-DI(2-HYDROXYBENZYL)-ETHYLENEDIAMINE-N,N'-DIACETIC ACID AND ITS DERIVATIVES<br/>[FR] PROCÉDÉ POUR LA PRÉPARATION DE CHÉLATES DE FE(III) DE L'ACIDE N,N'-DI(2-HYDROXYBENZYL)-ÉTHYLÈNEDIAMINE-N,N'-DIACÉTIQUE ET SES DÉRIVÉS
  申请人：PRZED PROD CONSULTINGOWE ADOB SP Z O O SP K

  公开号：WO2011006763A1

  公开（公告）日：2011-01-20

  The invention relates to the process for the preparation of iron(lll) chelates of N, N'- di(2-hydroxybenzyl)ethylenediamine-N,N'-diacetic acid and its derivatives of the formula (I) wherein both R substituents have the same meaning and represent H, C1 -C4 alkyl, CH2OH, SO3M or COOM, and M is a sodium, potassium or ammonium cation, wherein the aqueous solution of a corresponding chelating agent is contacted with metallic iron by the circulation of said aqueous solution through the bed of pieces of metallic iron in a flow reactor while simultaneously blowing air or oxygen through the aqueous solution of the chelating agent in the flow reactor, optionally in the presence of a hydrogen peroxide solution. Chelates of the formula (I) are useful as the components of plant fertilizers.

  该发明涉及一种制备铁（III）螯合物N，N'-二（2-羟基苯甲基）乙二胺-N，N'-二乙酸及其衍生物的过程，其化学式为（I），其中两个R取代基具有相同的含义，代表H，C1-C4烷基，CH2OH，SO3M或COOM，M为钠，钾或铵阳离子，其中通过将相应的螯合剂的水溶液通过金属铁的块状床在流动反应器中循环，同时通过在流动反应器中通过螯合剂的水溶液吹送空气或氧气，可选地在过氧化氢溶液的存在下，制备出化学式（I）的螯合物，用作植物肥料的组分。
• PROCESS FOR THE PREPARATION OF N,N'-BIS(2-HYDROXYBENZYL)ETHYLENEDIAMINE-N,N'-DIACETIC ACID AND ITS DERIVATIVES
  申请人：Nawrocki Adam

  公开号：US20100168469A1

  公开（公告）日：2010-07-01

  The invention relates to a process for the preparation of N,N′-bis(2-hydroxybenzyl)-ethylenediamine-N,N′-diacetic acid and its derivatives of general formula (I), wherein both R have the same meaning and are selected from H, C 1 -C 4 alkyl, CH 2 OH, SO 3 M, and COOM; and all M have the same meaning and represent hydrogen atom, Na, K or NH 4 ; which comprises reductive amination of glyoxylic acid with a salan compound of general formula (II), in the presence of an amine proton acceptor. The compounds of formula (I) can be used as chelating agents for micronutrients in fertilizer preparations for plants.

  本发明涉及一种制备N，N'-双（2-羟基苯甲基）-乙二胺-N，N'-二乙酸及其通式（I）衍生物的过程，其中两个R具有相同的含义，可选择自H，C1-C4烷基，CH2OH，SO3M和COOM中；所有的M具有相同的含义，代表氢原子，Na，K或NH4；该过程包括在胺质子受体的存在下，用通式（II）的萨兰化合物对乙酰乙酸进行还原胺化。通式（I）的化合物可用作植物肥料制备中微量营养素的螯合剂。
• Surface treatment composition and method for treating surface of substrate by using the same
  申请人：MITSUBISHI CHEMICAL CORPORATION

  公开号：EP0858102A2

  公开（公告）日：1998-08-12

  A surface treatment composition containing a complexing agent as a metal deposition preventive in a liquid medium, in which the complexing agent is an ethylenediaminephenol derivative of the following general formula (1) or its salt: wherein X1 and X2 are hydroxyl groups; Y1 to Y8 are respectively independently a hydrogen atom, a hydroxyl group, a halogen atom, a carboxyl group, a phosphonic acid group, a sulfonic acid group, a carbonyl group, a nitro group, a nitroso group, an amino group, an imino group, a nitrilo group, a nitrile group, a thiocyanate group, a hydroxyamino group, a hydroxyimino group, or an alkyl or alkoxy group which may have a substituent, provided that at least one of Y1 to Y8 is not a hydrogen atom; Z1 to Z4 are respectively independently a hydrogen atom, a carboxyl group or a sulfonic acid group; and R1 to R4 are respectively independently a hydrogen atom or an alkyl group which may have a substituent.

  一种含有络合剂的表面处理组合物，作为液体介质中的金属沉积防止剂，其中的络合剂是下式通式(1)的乙二胺苯酚衍生物或其盐： 其中 X1 和 X2 为羟基；Y1至Y8分别独立地为氢原子、羟基、卤素原子、羧基、膦酸基、磺酸基、羰基、硝基、亚硝基、氨基亚氨基、硝基、腈基、硫氰酸基、羟基氨基、羟基亚氨基、或可具有取代基的烷基或 烷氧基，条件是 Y1 至 Y8 中至少有一个不是氢原子；Z1 至 Z4 分别独立地为氢原子、羧基或磺酸基；以及 R1 至 R4 分别独立地为氢原子或可带有取代基的烷基。
• Substrate cleaning liquid media and cleaning method
  申请人：MITSUBISHI CHEMICAL CORPORATION

  公开号：EP1342777A1

  公开（公告）日：2003-09-10

  A substrate surface cleaning liquid medium and a cleaning method using the cleaning liquid medium which is capable of removing fine particulate contaminants from substrates for devices in the production of semiconductor devices, display devices, which cleaning liquid medium contains the following ingredients (A), (B), (C), and (D) , has a pH of 9 or higher, and a content of ingredient (C) of 0.01 to 4% by weight: (A) an ethylene oxide addition type surfactant which has an optionally substituted hydrocarbon group and a polyoxyethylene group in the same molecular structure and in which the ratio of the number of carbon atoms contained in the hydrocarbon group (m) to the number of oxyethylene groups in the polyoxyethylene group (n), m/n, is m/n≤1.5, (B) an alkali ingredient, (C) hydrogen peroxide, and (D) water.

  一种基底表面清洁液体介质和一种使用该清洁液体介质的清洁方法，该清洁液体介质能够去除半导体器件、显示器件生产设备基底上的微粒污染物，该清洁液体介质含有以下成分（A）、（B）、（C）和（D），pH 值为 9 或更高，成分（C）的含量为 0.01 至 4%（重量百分比）： (A) 环氧乙烷加成型表面活性剂，其分子结构中具有任选取代的烃基和聚氧 乙烯基，其中烃基所含碳原子数(m)与聚氧乙烯基中氧乙烯基数(n)之比 m/n 为 m/n≤1.5、 (B) 碱成分、 (C) 过氧化氢，以及 (D) 水。
• METHOD FOR CLEANING SURFACE OF SUBSTRATE
  申请人：MITSUBISHI CHEMICAL CORPORATION

  公开号：EP1389496A1

  公开（公告）日：2004-02-18

  A highly efficient method for cleaning a substrate, whereby in the cleaning of the substrate, ① in a short time, ② both particle contaminants and metal contaminants can be removed, and ③ a problem associated therewith, such as re-deposition of contaminants or a dimensional change due to etching, can be remarkably reduced, and which has the following characteristics. A method for cleaning a surface of a substrate, which comprises at least the following steps (1) and (2), wherein the step (2) is carried out after carrying out the step (1): Step (1): A cleaning step of cleaning the surface of the substrate with an alkaline cleaning agent containing a complexing agent, and Step (2): A cleaning step employing a cleaning agent having a hydrofluoric acid content C (wt%) of from 0.03 to 3 wt%, wherein the cleaning time t (seconds) of the substrate with said cleaning agent is at most 45 seconds, and C and t satisfy the relationship of 0.25≦tC1.29≦5.

  一种清洗基片的高效方法，在清洗基片的过程中，①在短时间内，②颗粒污染物和金属污染物都能被清除，③与之相关的问题，如污染物的再沉积或由于蚀刻引起的尺寸变化，可以显著减少，该方法具有以下特点。 一种清洁基底表面的方法，至少包括以下步骤（1）和（2）、 其中步骤(2)在步骤(1)之后进行： 步骤 (1)：用含有络合剂的碱性清洗剂清洗基底表面的清洗步骤，以及 步骤 (2)：使用氢氟酸含量 C（重量百分比）为 0.03 至 3 重量百分比的清洗剂的清洗步骤，其中使用所述清洗剂清洗基底的时间 t（秒）最多为 45 秒，且 C 和 t 满足 0.25≦tC1.29≦5。