1-(2,3,4-trihydroxy-phenyl)-heptan-1-one | 43043-27-2

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-(2,3,4-trihydroxy-phenyl)-heptan-1-one
• 英文别名: 1-(2,3,4-Trihydroxy-phenyl)-heptan-1-on；2,3,4-trihydroxyphenyl n-hexyl ketone；1-[2,3,4-Trihydroxyphenyl]-1-heptanone；1-(2,3,4-trihydroxyphenyl)heptan-1-one
• CAS: 43043-27-2
• 化学式: C₁₃H₁₈O₄
• 分子量: 238.284
• InChiKey: ULICCTKFOINEEJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  17
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.46
• 拓扑面积：
  77.8
• 氢给体数：
  3
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  庚酸 、 邻苯三酚 在 zinc(II) chloride 作用下， 生成 1-(2,3,4-trihydroxy-phenyl)-heptan-1-one
  参考文献：
  名称：

  Alkyl Phenols. I. The 4-n-Alkylpyrogallols¹

  摘要：

  DOI：

  10.1021/ja01301a036

文献信息

• Light-sensitive compositions
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0410760A2

  公开（公告）日：1991-01-30

  A light-sensitive composition comprising: (a) a polysiloxane compound having at least 1 mol% of a structural unit derived from a product of a thermal cycloaddition reaction between a compound of formula (I), (II), (III) or (IV) and a compound of formula (V), (VI), (VII) or (VIII), and (b) an orthoquinonediazide compound.

  一种光敏组合物，包括 (a) 聚硅氧烷化合物，其结构单元至少有 1 摩尔%来自式（I）、（II）、（III）或 （IV）化合物与式（V）、（VI）、（VII）或（VIII）化合物之间的热环化反应产物， 以及 (b) 邻醌噻嗪化合物。
• Positive type photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0445680A2

  公开（公告）日：1991-09-11

  A positive type photoresist composition which is superior in the prevention of pattern break and scumming during development, comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein said novolak resin is a condensate of a mixture of m-cresol and p-cresol with at least one of formaldehyde, formaldehyde polymer and formaldehyde precursor and wherein the relationship between X = A/(A+B+C) and the content of m-cresol in said novolak resin falls within the shaded part (including the straight lines surrounding this part) in Figure 1, said A representing an integrated value of peak area between 23.0 ppm and 31.0 ppm , B representing an integrated value of peak area between 31.0 ppm and 34.0 ppm and C representing an integrated value of peak area between 34.0 ppm and 37.0 ppm in a ¹³C-NMR spectrum of a dimethyl sulfoxide-d₆ solution of said novolak resin.

  一种正型光刻胶组合物，在显影过程中可有效防止图案破裂和浮渣，该组合物由碱溶性酚醛树脂和 1,2-醌噻嗪化合物组成，其中所述酚醛树脂是间甲酚和对甲酚与甲醛、甲醛聚合物和甲醛前体中至少一种的混合物的缩合物、其中，X = A/(A+B+C) 与间甲酚在所述酚醛树脂中的含量之间的关系在图 1 中的阴影部分（包括围绕该部分的直线）内，所述 A 代表峰面积的综合值，介于 23.在所述酚醛树脂的二甲亚砜-d₆溶液的¹³C-NMR 光谱中，A 代表峰面积的综合值在 23.0 ppm 和 31.0 ppm 之间，B 代表峰面积的综合值在 31.0 ppm 和 34.0 ppm 之间，C 代表峰面积的综合值在 34.0 ppm 和 37.0 ppm 之间。
• Photoresist composition and etching method
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0540032A1

  公开（公告）日：1993-05-05

  A positive type or negative type photoresist composition for fine processing having excellent resolution, sensitivity, adhesive-ness and developability comprising: (a) an alkali soluble resin or a resin having anti-alkali dissolution groups in the molecules thereof, (b) a light-sensitive compound, and (c) at least one organic compound selected from the group consisting of organic phosphorus acid compounds and esters thereof in an amount of 0.001 to 10% by weight based on a weight of the resin. In addtion, the present invention is directed to an etching method utilizing the positive type or negative type photoresist composition.

  一种用于精细加工的正型或负型光刻胶组合物，具有优异的分辨率、灵敏度、粘合性和显影性，包括 (a) 碱溶性树脂或在其分子中含有抗碱溶解基团的树脂、 (b) 一种光敏化合物，和 (c) 至少一种选自有机磷酸化合物及其酯类的有机化合物，其含量为树脂重量的 0.001 至 10%。此外，本发明还涉及一种利用正型或负型光刻胶组合物的蚀刻方法。
• Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures
  申请人：OCG MICROELECTRONIC MATERIALS, INC.

  公开号：EP0561625A1

  公开（公告）日：1993-09-22

  A radiation-sensitive composition comprises an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one polylactide compound; the amount of said binder resin being about 60 to 95% by weight, the amount of said photoactive component being about 5% to about 40% by weight, based on the total solids content of said radiation-sensitive compostion.

  一种辐射敏感性组合物包括以下物质在溶剂中的混合物：至少一种碱溶性粘合剂树脂、至少一种光活性化合物和有效提高敏感性的至少一种聚乳酸化合物；根据所述辐射敏感性组合物的总固体含量，所述粘合剂树脂的含量约为 60% 至 95%（按重量计），所述光活性成分的含量约为 5%至 40%（按重量计）。
• High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions
  申请人：OCG MICROELECTRONIC MATERIALS, INC.

  公开号：EP0623633A2

  公开（公告）日：1994-11-09

  A phenolic novolak composition prepared by a process characterized by the steps of: (1) reacting a first phenolic monomer comprising a major portion of at least one trifunctional phenolic monomer with a first aldehyde source in the absence of a catalyst at a reaction temperature from about 100°C to about 200°C and at a reaction pressure of about 2 to about 15 atmospheres to form a phenolic oligomer having a weight average molecular weight from about 500 to about 2,000, having ortho-ortho bonding of about 55% to about 75% of the methylene bonds between the phenolic moieties; and having a time to clear of less than 125 seconds per micron; wherein the mole ratio of said first aldehyde source to said first phenolic monomer is from about 0.3:1.0 to about 0.55:1.0; and (2) then reacting said oligomer with an optional second phenolic source and a second aldehyde source at a temperature from about 80°C to about 150°C to form a phenolic novolak having a weight average molecular weight of 3,000 to 40,000, having ortho-ortho bonding of between 50% and 70% of the methylene bonds between the phenolic moieties, and having a time to clear of at least 20 seconds per micron; wherein the mole ratio of said second aldehyde source to said total phenolic moieties is less than about 0.8:1.0.

  一种酚醛树脂组合物，其制备过程包括以下步骤 (1) 在没有催化剂的情况下，在反应温度约为 100°C 至约 200°C，反应压力约为 2 至约 15 个大气压的条件下，使包含至少一种三官能酚类单体的主要部分的第一酚类单体与第一醛源反应，以形成酚类低聚物，该酚类低聚物的重量平均分子量约为 500 至约 2,000，酚基之间的亚甲基键的正交键合率约为 55% 至约 75%；其中所述第一醛源与所述第一酚单体的摩尔比为约 0.3:1.0至约0.55:1.0；以及 (2) 然后将所述低聚物与任选的第二酚源和第二醛源在约80℃至约150℃的温度下反应，以形成酚醛新酯，其重量平均分子量为3,000至40,000，酚基之间50%至70%的亚甲基键为正交键，且每微米的透明时间至少为20秒；其中所述第二醛源与所述酚基总量的摩尔比小于约0.8:1.0。