申请人:BASF Aktiengesellschaft
公开号:US05256633A1
公开(公告)日:1993-10-26
Oxazole- and thiazolecarboxamides of the formulae Ia and Ib ##STR1## where the substituents have the following meanings: oxygen or sulfur; hydrogen; halogen; substituted or unsubstituted C.sub.1 -C.sub.6 -alkyl, benzyl, cycloalkyl, alkenyl, alkynyl, phenyl, phenoxy or phenylthio; alkoxy; alkylthio; haloalkoxy; haloalkylthio; or a substituted or unsubstituted 5- or 6-membered heterocyclic radical; formyl, 4,5-dihydrooxazol-2-yl or --COYR.sup.5 ; oxygen or sulfur; hydrogen; cycloalkyl; substituted or unsubstituted alkyl, phenyl, benzyl, alkenyl, cycloalkenyl or alkynyl; a substituted or unsubstituted 5- or 6-membered heterocyclic radical; phthalimido; tetrahydrophthalimido; succinimido; maleiimido; one equivalent of a cation; or --N.dbd.CR.sup.6 R.sup.7 ; R.sup.6, R.sup.7 hydrogen; alkyl; cycloalkyl; phenyl; furyl or together a methylene chain or 4 to 7 members; hydrogen or substituted or unsubstituted alkyl or cycloalkyl; R.sup.4 hydroxy; alkoxy; substituted or unsubstituted alkyl, cycloalkyl, alkenyl, alkynyl, phenyl or naphthyl; a substituted or unsubstituted 5- or 6-membered heterocyclic radical; or R.sup.3 and R.sup.4 together are --(CH.sub.2).sub.n --Y.sub.p --(CH.sub.2).sub.q --, where n and q are 1, 2 or 3, p is 0 or 1 and Y is oxygen, sulfur or N-methyl, or form a radical of the formula --(CH.sub.2).sub.3 --CO--, and their environmentally tolerated salts, X is formula Ib not being sulfur when R.sup.1 is 3-pyridyl, R.sup.2 is CO.sub.2 CH.sub.2 CH.sub.3 or R.sup.3 is hydrogen, and X in formula Ia X not being sulfur and R.sup.1 not being thien-2-yl when YR.sup.5 is OH, R.sup.3 is hydrogen and R.sup.4 is methyl, processes for manufacturing such compounds and herbicidal agents containing compounds of the formula Ia or Ib as active ingredients.
Ia和Ib式的噁唑和噻唑羧酰胺,其中取代基具有以下含义:氧或硫;氢;卤素;取代或未取代的C.sub.1-C.sub.6烷基,苄基,环烷基,烯基,炔基,苯基,苯氧基或苯硫基;烷氧基;烷基硫基;卤代烷氧基;卤代烷基硫基;或取代或未取代的5-或6-成员杂环基;甲酰基,4,5-二氢噁唑-2-基或--COYR.sup.5;氧或硫;氢;环烷基;取代或未取代的烷基,苯基,苄基,烯基,环烷烯基或炔基;取代或未取代的5-或6-成员杂环基;邻苯二甲酰亚胺基;四氢邻苯二甲酰亚胺基;琥珀酰亚胺基;马来酰亚胺基;一个阳离子当量;或--N.dbd.CR.sup.6R.sup.7;R.sup.6,R.sup.7氢;烷基;环烷基;苯基;呋喃基或一起的亚甲基链或4到7个成员;氢或取代或未取代的烷基或环烷基;R.sup.4羟基;烷氧基;取代或未取代的烷基,环烷基,烯基,炔基,苯基或萘基;取代或未取代的5-或6-成员杂环基;或R.sup.3和R.sup.4一起是--(CH.sub.2).sub.n--Y.sub.p--(CH.sub.2).sub.q--,其中n和q为1、2或3,p为0或1,Y为氧、硫或N-甲基,或形成式的基团--(CH.sub.2).sub.3--CO--,以及它们的环境可耐受盐,当R.sup.1为3-吡啶基,R.sup.2为CO.sub.2CH.sub.2CH.sub.3或当YR.sup.5为OH,R.sup.3为氢,R.sup.4为甲基时,公式Ib的X不是硫,公式Ia的X不是硫且R.sup.1不是噻吩-2-基,用于制造这种化合物的过程和包含Ia或Ib式化合物作为活性成分的除草剂。