2-[二(2-氰基乙基)氨基]乙酸 | 6295-23-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 中文名称: 2-[二(2-氰基乙基)氨基]乙酸
• 英文名称: [N,N-Bis(2-cyanoethyl)]-glycine
• 英文别名: N,N-Bis-<2-cyan-ethyl>-glycin；N,N-Dicyanethyl-glycin；N,N-Di-<2-Cyanethyl>-glykokoll；N,N-Bis-(2-cyan-aethyl)-glycin；2-(bis(2-cyanoethyl)amino)acetic acid；n,n-Bis(2-cyanoethyl)glycine；2-[bis(2-cyanoethyl)amino]acetic acid
• CAS: 6295-23-4
• 化学式: C₈H₁₁N₃O₂
• 分子量: 181.194
• InChiKey: KIGQVWWOESIMBG-UHFFFAOYSA-N

物化性质

• 溶解度：
  2.87 M

计算性质

• 辛醇/水分配系数(LogP)：
  -3
• 重原子数：
  13
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  88.1
• 氢给体数：
  1
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  2-[二(2-氰基乙基)氨基]乙酸 在 Raney Co 氨 、 氢气 作用下， 以 甲醇 为溶剂， 70.0 ℃ 、6.89 MPa 条件下， 反应 7.0h， 生成 [N,N-Bis(3-aminopropyl)]-glycine
  参考文献：
  名称：

  Peptide Dendrimers from Natural Amino Acids

  摘要：

  DOI：

  10.1002/(sici)1521-3765(19990702)5:7<2133::aid-chem2133>3.0.co;2-j
• 作为产物：
  描述：

  丙烯腈 、 聚甘氨酸 在 四甲基氢氧化铵 作用下， 以 水 为溶剂， 以99.3%的产率得到2-[二(2-氰基乙基)氨基]乙酸
  参考文献：
  名称：

  STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION

  摘要：

  本发明涉及将酰胺肟用于预防或稳定羟基胺化合物，防止其不受控分解。

  公开号：

  US20090112024A1

文献信息

• NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION
  申请人：Lee Wai Mun

  公开号：US20090111965A1

  公开（公告）日：2009-04-30

  The present application relates to semiconductor processing compositions comprising at least one compound containing at least one amidoxime functional group and to methods of using these compositions in semiconductor processing. The present application also describes the preparation of amidoximes for a semiconductor processing composition by (a) mixing a cyanoethylation catalyst, a nucleophile and an alpha-unsaturated nitrile to produce a cyanoethylation product; and (b) converting a cyano group in the cyanoethylation product into an amidoxime functional group.

  本申请涉及包含至少一个含有至少一个酰胺肟功能团的化合物的半导体加工组合物，以及使用这些组合物进行半导体加工的方法。本申请还描述了通过(a)混合氰乙基化催化剂、亲核试剂和不饱和α腈以产生氰乙基化产品；(b)将氰乙基化产品中的氰基团转化为酰胺肟功能团来制备用于半导体加工组合物的酰胺肟的方法。
• Amine salts of amino acids as delayed action catalysts
  申请人：Air Products & Chemicals, Inc.

  公开号：US04115634A1

  公开（公告）日：1978-09-19

  The amine salts of amino acid compositions have been found to be effective as a delayed action catalyst for organometallic catalyzed urethane synthesis. The acid which provides the basis for the salts is characterized generally by reacting an amine with an unsaturated acid, or with formaldehyde and hydrogen cyanide followed by hydrolysis of the resulting nitrile.

  氨基酸组成的胺盐被发现作为有机金属催化的聚氨酯合成的延迟作用催化剂是有效的。提供盐基础的酸通常是通过将胺与不饱和酸反应，或与甲醛和氢氰酸反应后水解所得的腈反应而被表征。
• CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE
  申请人：Lee Wai Mun

  公开号：US20090130849A1

  公开（公告）日：2009-05-21

  A composition and associated method for chemical mechanical planarization (or other polishing) is described. The composition contains an amidoxime compound and water. The composition may also contain an abrasive and a compound with oxidation and reduction potential. The composition is useful for attaining improved removal rates for metal, including copper, barrier material, and dielectric layer materials in metal CMP. The composition is particularly useful in conjunction with the associated method for metal CMP applications.

  本文描述了一种化学机械平整化（或其他抛光）的组合物及其相关方法。该组合物含有一种酰胺肟化合物和水。该组合物还可以含有磨料和具有氧化还原潜力的化合物。该组合物可用于在金属CMP中获得改进的金属去除速率，包括铜、屏障材料和金属CMP中的介电层材料。该组合物在金属CMP应用的相关方法中特别有用。
• METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMOSITIONS
  申请人：Lee Wai Mun

  公开号：US20100043823A1

  公开（公告）日：2010-02-25

  The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The compositions of the invention may optionally contain one or more other acid compounds, one or more basic compounds, and a fluoride-containing compound and additional components such as organic solvents, chelating agents, amines, and surfactants. The invention also relates to a method of removing residue from a substrate during integrated circuit fabrication.

  本发明涉及含有酰胺肟化合物的水性组合物及其清洗半导体衬底上等离子体刻蚀残留物的方法，包括这种稀释的水性溶液。本发明的组合物可以选择性地含有一种或多种其他酸性化合物、一种或多种碱性化合物、含氟化合物和其他成分，如有机溶剂、螯合剂、胺和表面活性剂。本发明还涉及一种在集成电路制造过程中从衬底上去除残留物的方法。
• PROCESS OF PURIFICATION OF AMIDOXIME CONTAINING CLEANING SOLUTIONS AND THEIR USE
  申请人：Lee Wai Mun

  公开号：US20100105594A1

  公开（公告）日：2010-04-29

  The invention relates to processes for producing and using amidoxime compounds with low trace metal impurities. The invention further relates to compositions comprising amidoxime compounds with low trace metal impurities, such compositions useful for cleaning or removing residues from semiconductor substrates and/or equipment.

  本发明涉及生产和使用低微量金属杂质的酰胺肟化合物的方法。本发明还涉及包含低微量金属杂质的酰胺肟化合物的组合物，这种组合物可用于清洁或去除半导体基板和/或设备中的残留物。